Chinese semiconductor industry
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It's a bit off topic, but I do think measures to make it easier to catch up in long threads like this are warranted (i.e. threadmarks, and some tweaks to the search system). Outside of us who are active every day and keep bookmarks in this thread it takes a fair bit of effort to retrieve information here, especially now that we have thousands of pages in this thread.
No one liners, provide sources, and quality posts please. This is a flagship thread, not a casual thread.
Two-dimensional Hanning self-convolution window for enhancing Moiré fringe alignment in lithography
Feifan Xu, Yulu Zhao, Lanlin Ni, Qiang Wu, Haojie Xia
Mechanical Systems and Signal Processing 208, 111052, 2024
The current image processing techniques heavily rely on classic windows for suppressing spectral leakage. However, the limited capability of these classic windows to suppress spectral leakage restricts their application in the field of high-precision measurement. This paper proposes a novel family of windows capable of suppressing spectral leakage associated with the Moiré fringes pattern, thereby enhancing the accuracy of lithography alignment. Specifically, a novel two-dimensional Hanning self-convolution window is introduced, which is derived from the Hanning window to inherit its advantage of ultra-rapid sidelobe decay. The behaviors of the main lobe and desirable sidelobes of the 1st- to 4th-order are examined. Additionally, a novel fringe phase extraction algorithm is established based on the proposed window, which demonstrates high accuracy and efficiency. Simulation and experimental results validate the feasibility and practicality of the proposed window. In particular, the proposed window outperforms classic windows in suppressing spectral leakage, thereby successfully enhancing the phase extraction accuracy to achieve high-precision misalignment measurement at the sub-2-nm level (1.47 nm @ 3σ criterion). The proposed method can be easily extended to other real engineering applications utilizing fringe to achieve high-precision measurements, such as fringe projection profilometry, damage detection, and visual mechanical vibration monitoring.
Mechanical Systems and Signal Processing 208, 111052, 2024
The current image processing techniques heavily rely on classic windows for suppressing spectral leakage. However, the limited capability of these classic windows to suppress spectral leakage restricts their application in the field of high-precision measurement. This paper proposes a novel family of windows capable of suppressing spectral leakage associated with the Moiré fringes pattern, thereby enhancing the accuracy of lithography alignment. Specifically, a novel two-dimensional Hanning self-convolution window is introduced, which is derived from the Hanning window to inherit its advantage of ultra-rapid sidelobe decay. The behaviors of the main lobe and desirable sidelobes of the 1st- to 4th-order are examined. Additionally, a novel fringe phase extraction algorithm is established based on the proposed window, which demonstrates high accuracy and efficiency. Simulation and experimental results validate the feasibility and practicality of the proposed window. In particular, the proposed window outperforms classic windows in suppressing spectral leakage, thereby successfully enhancing the phase extraction accuracy to achieve high-precision misalignment measurement at the sub-2-nm level (1.47 nm @ 3σ criterion). The proposed method can be easily extended to other real engineering applications utilizing fringe to achieve high-precision measurements, such as fringe projection profilometry, damage detection, and visual mechanical vibration monitoring.
Ok, so pretty much confirms my previous statement that Patel has got things backwards.
In fact, he basically contradicts himself in his last paragraph.
It is the responsibility of the US companies to follow the sanctions, NOT CXMT. CXMT cannot violate export controls, they are not the exporter!
Why he continues to call CXMT the violator multiple times makes no sense.
Guangduo Micronano completed nearly 100 million yuan in Series B+ financing
According to Mams Consulting, Suzhou Guangduo Micro-Nano Technology Co., Ltd. (referred to as Guangduo Micro-Nano) recently completed a B+ round of equity financing of nearly 100 million yuan invested by SDIC Venture Partners.
As the leading provider of complete solutions for nanoimprint technology in China, Guangduo Micronano has manufactured a variety of research and development nanoimprint equipment and fully automatic mass production nanoimprint equipment after years of research and development and market application promotion, achieving All-round breakthroughs in equipment, consumables and processes.
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