from the old thread , members already mentioned dry scanners being made in 2021 by two different vendors.If its completely domestic, could be, I know the Shanghai Integrated Circuit Equipment Materials Industry Innovation Center is running purely domestic fabs with SMEE scanners, Naura and others equipment manufacturers tools but these are small-medium production runs to test equipments, materials, parts and solve production problems.
Now it's almost 2024, that scanners should be out already and being used? I am interested in look at the new lens stack up. what NA is for 65nm?
WTAN
Junior Member
Registered MemberCETC is currently beginning to mass produce its 65nm Resolution or 45nm Node Dry DUVL.ansy1968 said:
@WTAN as you mentioned before maybe CETC may have a 28nm or 22nm DUVL project in conjunction with SMEE?
This can produce 45nm Chips with single exposure.
The next step for CETC is to produce a 28nm Node Immersion DUVL which is similar to the latest SMEE model.
I believe they are already working on this 28nm DUVL and we might see something soon.
More competition is good for the Lithograph Industry in China.
CETC is quickly catching up to SMEE and might one day surpass it.
CETC is a much larger company and has more resources and finances to develop new products.
SMEE has more experience in Lithographs but i think it lacks financial resources and talent.
CETC might end up producing a EUVL as well, maybe before SME