Chinese semiconductor industry

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Focusing on the application of magnetic levitation technology in the ultra-clean field, Panshi Technology completed tens of millions of yuan in Pre-A round financing​


Panshi Technology (Shenzhen) Co., Ltd. (hereinafter referred to as: Panshi Technology) recently completed tens of millions of yuan in Pre-A round financing, led by Yingfutek, followed by Cornerstone Capital, Tianwen Times, and Xianzhi (Beijing) Industrial Technology cast. After the completion of this round of financing, Panshi Technology will accelerate the industrialization of multiple models of magnetic levitation bearing-less pumps, and will also promote the application of magnetic levitation technology in more scenarios.
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In recent years, the rise of magnetic levitation technology in the industrial field has marked a revolution in today's technology field. Its non-contact motion characteristics have brought important advantages such as no wear, ultra-cleanliness, high efficiency and energy saving, and precise control, providing services to many industries. The possibility of achieving ultra-high standard process requirements.

Taking the semiconductor industry as an example, with the continuous advancement of chip manufacturing technology, the difficulty of processing semiconductors has reached unprecedented heights. In the wet process process, which involves the most processing, extremely high requirements are placed on the performance of fluid transport components. As an important fluid transport component, the magnetic levitation bearingless pump adopts the non-contact driving method of magnetic levitation, which completely separates the pump head from the motor, eliminating the risk of leakage such as dynamic seals, and significantly improving safety. The impeller inside the pump head can be completely suspended under the action of the magnetic field without any contact with the pump head, avoiding medium contamination problems such as particle contamination. In addition, the use of ultra-pure Teflon material can meet the highest level of ultra-clean requirements. The magnetic levitation bearingless motor's precise levitation rotation control of the impeller enables it to achieve smoother flow control compared to traditional bellows pumps/diaphragm pumps. Moreover, since there are no mechanical loss parts such as diaphragms, it has become the ideal choice for most wet processes. The best solution for your process.

Currently, China has emerged as the world's largest semiconductor equipment market. The import value of semiconductor equipment will reach US$28.27 billion in 2022. The market share of domestic semiconductor equipment in mainland China is 23%, an increase of 3.4 percentage points from 2021 (19.6%). As the United States continues to strengthen its technological control over China, it has become increasingly difficult to obtain advanced semiconductor equipment, and the control of upstream materials and core components has become more stringent. The development of the domestic semiconductor industry is facing severe challenges. The magnetic levitation bearingless pump has also become one of the core components restricting the development of wet process equipment in my country.

Dr. Cui Qingwen, the founder of Panshi Technology, has been engaged in magnetic levitation technology research overseas for more than ten years and has accumulated rich experience in the application of magnetic levitation technology on top international platforms. After returning to China, he formed an excellent entrepreneurial team dedicated to the industrial application of magnetic levitation technology. Under the leadership of Dr. Cui, the company has successfully broken through core technical problems such as multi-degree-of-freedom levitation rotation control, large-range high-precision displacement sensing, high-precision magnetic field encoding, and large-gap precision electromagnetic control, and successfully developed and put into production multiple models of magnetic levitation vehicles. The bearingless pump has obtained more than 20 core patents, breaking the foreign technology monopoly and injecting new vitality into the localization of semiconductor equipment. This project also won the highest award in the finals of the Ministry of Science and Technology’s 2022 National Disruptive Technology Innovation and Entrepreneurship Competition, and has received widespread attention and recognition. Panshi Technology is contributing to the localization of high-end semiconductor equipment in my country and helping the semiconductor industry achieve a greater leap.

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Hidden Crown Semiconductor: High-end mass detection motion system fills the domestic gap.​


Hidden Crown Semiconductor was established in 2019. It is a high-tech innovative enterprise focusing on the research and development of key core precision motion components for semiconductor manufacturing, quality inspection and packaging equipment. It provides superior and reliable solutions for precision motion positioning and control. Solutions, focusing on solving the industrialization problems of key core components of semiconductor equipment. Since its establishment, its revenue has doubled year by year, and it has completed 4 rounds of financing and invested in 2 upstream companies.

Today, Hidden Crown Semiconductor is gradually growing and has established subsidiaries in Suzhou, Chengdu, and Guangzhou. At the same time, Hidden Crown Semiconductor has two major bases in Shanghai and Wujiang, Suzhou, and has built four major production lines of precision motion tables, special motors, piezoelectric products, and drive control products. It is equipped with advanced precision motion control test platforms and a batch of special tools, which can Provide good production and testing conditions for the R&D and production of high-end equipment and precision component products.

Since its establishment, the company has gradually developed full-circle operation control system development capabilities from firmware, embedded software to algorithms, has system-level control solutions for multi-axis motion that can match product needs, and has full-process motor control from electromagnetic simulation design to motor production. R&D capabilities, and gradually formed a full-chain piezoelectric ceramic production line from powder formulation to tape casting and sintering . The product has a wide range of application scenarios, mainly including wafer quantity detection, wafer bonding, motion control and compensation algorithms, high-precision measurement, microscope objective lens positioning, multi-axis motion and positioning platforms and other semiconductor fields and pan-semiconductor scenarios.

As one of the core components of front-line measurement equipment, the precision motion system provides necessary transmission capabilities and precise positioning capabilities for semiconductor devices. According to the different functions and needs of the equipment, the corresponding motion control system also has different requirements. These core motion control system technologies are mainly controlled by European and American countries. Therefore, Hidden Crown Semiconductor can be regarded as a new entrant and game-breaker in this field. Especially in the field of high-end mass detection motion systems, Hidden Crown Semiconductor has filled the domestic gap, enhanced domestic supporting capabilities, achieved import substitution, and achieved independent intellectual property rights. Take control.

As a domestic leader in this field and one that will compete with major international manufacturers, Hidden Crown Semiconductor has attached great importance to the layout, protection and innovation of intellectual property rights since its establishment. Today, Hidden Crown Semiconductor has applied for more than 200 patents, including more than 150 valid authorized patents, more than 60 domestic invention patents, and 6 PCTs.

Hidden Crown serves many outstanding companies in the field of semiconductor equipment. Its product precision operation control system has significant advantages in typical indicators such as repeated positioning accuracy, acceleration and vacuum adaptability, and some of them have reached the world's leading level. With these innovative breakthroughs, Hidden Crown Semiconductor has also won various projects and awards: in 2020, it won the Silver Award at the Shanghai "Sea Gathering of Talents" Innovation and Entrepreneurship Summit; in 2021, it was recognized as a high-tech enterprise; in 2022, it was awarded the title of patent work pilot enterprise; In March 2023, it was recognized as a municipal-level "specialized and innovative" small and medium-sized enterprise. In July, it was recognized as a postdoctoral innovation practice base in Pudong New Area, Shanghai. In September, it was recognized as a Shanghai enterprise technology center.​


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VTEX Semiconductor Vacuum Valve China Manufacturing Headquarters Project Signed and Settled​


According to the "Zui Taihu" public account, on December 6, Taihu Resort and Japan's Vetkus Co., Ltd. (VTEX) held a cooperation signing ceremony for the semiconductor vacuum valve China manufacturing headquarters project.

According to the cooperation agreement, VTEX will build a Chinese manufacturing headquarters for semiconductor vacuum valves in the resort, mainly engaged in the research and development, design, production and sales of vacuum valves, further expanding the Chinese market and injecting strong impetus into the development of the semiconductor industry in Wuzhong District.

Data shows that VTEX is a professional manufacturer of vacuum valves and explosion-proof discs, and is a leading semiconductor parts company in the industry. It has a number of patented technologies in the field of ultra-vacuum valves. It has a unique rollcam structure that enables vacuum valves to achieve zero vibration and zero dust. The products are widely used in semiconductors, LCD panels, and solar cutting-edge industries.

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TCL Huaxing promotes the upgrading of the display industry: the world's first printed OLED, MLCD, LTPO products, the first semiconductor display AI large model.​


TCL CSOT Global Display Ecosystem Conference (hereinafter referred to as DTC2023) was held in Wuhan. The conference brings together hundreds of partners and industry experts from around the world to discuss cutting-edge display technology applications and future development trends. At this conference, TCL CSOT continued to focus on the smart screen display ecosystem, openly demonstrated new products, technologies, ecosystems and global strategic layout, and released a number of blockbuster products based on cutting-edge display technology, which aroused widespread concern among industry insiders. focus on.

65-inch 8K printed OLED curved display

The world's first 65-inch 8K printed OLED curved display is currently the largest size of printed OLED display in the world. It has 33 million pixels and a million-level contrast ratio, which can present extremely clear and stunning large-screen vision. Combined with the 120Hz high refresh rate and 135° wide viewing angle, you can get a silky smooth viewing experience no matter which angle is C position. Compared with the current mass-produced evaporation process, the printed OLED technology process is relatively simple. The utilization rate of luminescent materials is as high as 90%, which is 2 times higher than similar technology products. Blue light radiation can be reduced by 50%. It is more energy-saving and environmentally friendly, and can effectively Eye protection.

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14-inch 2.8K printed Hybrid OLED laptop display

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This is the first representative product of TCL Huaxing's printed OLED technology to enter the notebook display field, achieving a technological breakthrough of mass production level 240PPI. With the support of 2.8K high resolution and DCI-P3 99.7% color gamut coverage, every detail of the screen is clearly visible, and every frame is colorful, giving users an unparalleled visual experience. It also supports 30~120Hz adaptive refresh rate, bringing silky and smooth dynamic picture performance while significantly reducing power consumption.

150-inch MLCD zero-joint commercial display

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In commercial display scenarios, TCL Huaxing integrates the technical advantages of LCD and LED through its independently innovative MLCD technology. It can achieve 1*N zero-seam unlimited splicing in product form, and can support intelligent analysis according to different meeting scenarios. screen display, significantly improving office efficiency; in terms of picture quality performance, TCL Huaxing uses LCD+LED hybrid compensation calibration technology to make the difference in chromaticity between LCD and LED less than three thousandths, making the picture transition natural and smooth, and supporting 6K4K display. Bringing a higher definition picture quality experience. In addition, in order to reduce user costs, TCL Huaxing adopts the magnetic fixation design of Mini LED light strips, which makes installation and maintenance more convenient.

Real RGB 1727PPI 2.1-inch LTPO-VR LCD head-mounted display

To achieve the world's highest pixel density of 1727PPI for VR head-mounted display equipment, TCL Huaxing has broken through the limits of current LCD design and manufacturing processes, effectively solved the screen door effect problem of VR head-mounted display equipment, eliminated the graininess of the picture, and further improved the user experience. immersion. Thanks to the blessing of LTPO technology and new process materials, this VR headset maintains industry-leading levels in terms of high transmittance, high refresh rate, narrow frame, and low power consumption. In addition, in order to solve the dynamic blur problem of VR head-mounted displays and reduce the dizziness of users when worn for a long time, TCL Huaxing uses Fast-LCD technology to achieve a product response time of <4ms, combined with a high refresh rate of 70~120Hz and low smear. technology, significantly improving user comfort.

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"X-intelligence" large model

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In order to meet the panel industry's high requirements for AI large models, TCL CSOT has teamed up with TCL Industrial Research Institute, Tsinghua KEG team & Zhipu AI team, and the National New Display Technology Innovation Center team to develop the world's first industry vertical large model in the display field - —“X-intelligence”.

The "X-intelligence" large model is designed to meet the needs of the display industry. It has powerful natural language processing and knowledge reasoning capabilities, can deeply understand related terms and concepts, and can surpass GPT4 in the display field. The release of the "X-intelligence" large model marks an important step in the application of large model technology in the display field, helping enterprises to continue to improve their production efficiency and take their innovation capabilities to a new level. At the same time, the "X-intelligence" large model can be deployed privately, strictly ensure data security, build a technological moat in the display field, and effectively promote the upgrading of China's display industry.

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Nanjing University progress on halide vapor phase epitaxy equipment for the growth of​

GAN and Ga2O3 and substrates.​


The report introduces research progress in large-size HVPE equipment simulation and emulation, HVPE-GaN substrate material technology, HVPE-GaN single crystal substrate technology, HVPE-GaN substrate equipment and material technology, and GaN single crystal substrate stripping technology. Large-scale HVPE equipment simulation and simulation, using the finite element method to simulate the gas transport phenomenon in the 6-inch HVPE reaction chamber, in order to obtain the best process parameters to meet the film growth requirements of high growth rate and high uniformity at the same time. Large-size general-purpose HVPE domestically produced equipment, high growth rate (>100µm/h), high thickness uniformity (>95%), independent nucleation, high utilization rate of gallium source and stable supply for a long time, long-life reaction chamber, universal Strong resistance (GaN/Ga2O3 epitaxy and mutual substrate epitaxy).

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New advances in High power and High Repetition Rate 266nm (KrF like) Solid State DUV Laser.​


The characteristics of deep ultraviolet laser, such as high photon energy and short wavelength, have important application value in laser processing, semiconductor lithography and other fields. Solid laser nonlinear frequency conversion is the main way to achieve high-power, high-coherence deep ultraviolet laser output. An all-solid-state 532 nm laser is used as the fundamental frequency light and the domestic commercial CsLiB 6 O 10 (CLBO) crystal is used as the frequency conversion crystal. When the fundamental frequency optical power is 34.2 W, an average power of 14 W, a repetition frequency of 100 kHz, and a pulse are achieved. 266 nm deep UV laser output with a width of 1.8 ns. Its light-to-light conversion efficiency reaches 41%, which is the first time that the conversion efficiency of a solid-state deep ultraviolet light source in China has exceeded 40%. This deep ultraviolet light source has the advantages of high efficiency and compact structure, and also verifies the practicality of domestic commercial CLBO crystals, so that more stable and higher-power deep ultraviolet laser output can be obtained.

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CAS may have reached 100,000 molten droplets per second, now working on stability.​


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Generating the quantity (really frequency) of droplets isn't really a parameter that requires progressive technical improvements. That's just a direct function of the frequency you are shaking the stream at to generate the droplets (the basic physics here is that you send a periodic mechanical vibration with a piezo through the stream and that breaks the stream into the frequency of droplets in a fixed amount of time as determined by the vibration frequency and the stream velocity). What *is* potentially a challenge is trying to control the characteristics ( mainly shape and size) of the droplets to be consistent for the downstream (pun intended) physics that you want to do with those droplets. That said going up to 100k kHz probably indicates something about the design of the machine. Higher frequency of excitations means higher wattage for the light output which either implies very aggressive power output and/or alternatively lower conversion efficiency. One of the open questions I'm still trying to sort out is whether the one or two designs being assembled currently are using a YAG laser or a CO2 laser, and this matters because these two lasers have different wavelengths and thus different excitation efficiency curves with molten tin.
 
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latenlazy said:
Generating the quantity (really frequency) of droplets isn't really a parameter that requires progressive technical improvements. That's just a direct function of the frequency you are shaking the stream at to generate the droplets (the basic physics here is that you send a periodic mechanical vibration with a piezo through the stream and that breaks the stream into the frequency of droplets in a fixed amount of time as determined by the vibration frequency and the stream velocity). What *is* potentially a challenge is trying to control the characteristics ( mainly shape and size) of the droplets to be consistent for the downstream (pun intended) physics that you want to do with those droplets. That said going up to 100k kHz probably indicates something about the design of the machine. Higher frequency of excitations means higher wattage for the light output which either implies very aggressive power output and/or alternatively lower conversion efficiency. One of the open questions I'm still trying to sort out is whether the one or two designs being assembled currently are using a YAG laser or a CO2 laser, and this matters because these two lasers have different wavelengths and thus different excitation efficiency curves with molten tin.
Click to expand...
Considering that last time I remember their rate generation was just 20Khz, means the have achieve some progress in molten droplet generation, but the paper said there is still some work. If you ask me I am thinking they are going for a lot of EUV power.​

For the laser configuration this paper stated a preference for a C02 MOPA laser.

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Personally as exciting as would be seeing China developing their own High power EUV LPP light source I am putting my money in Free Electron Lasers-like sources like SSMB and others as the future of EUV lithography.
 
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