He's pro TW independence, that should answer your q's.
Chinese semiconductor industry
- Thread starter Hendrik_2000
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why is that a bad thing for China? The more that Biden admin incorrectly assess China's semi industry, the worse their policies will be?
btw, the thing to watch out for is when SK & Samsung's DRAM/Nand fabs in China start to really use AMEC equipments.
AMEC says their equipment is used (or going to be used) in 3nm process
SSMB is a type of FEL, so he is saying pretty much what we had been saying here since 2021, weird that is now that people are putting interest to the idea of this type of technology.
SSMB is the more advance and will be probably the one who power future China EUV machines but is not the only project because according the research literature synchrotron-EUV lithography and conventional EUV FEL project is underway.
In a remarkable paper titled “, published in the Chinese journal Acta Physica Sinica, scientists from Beijing’s Tsinghua University propose a plan to build an accelerator the size of a football field and use it as a light source for a few dozens of EUV machines working simultaneously. The accelerator in question is a circular ring-shaped device where charged particles, such as electrons or protons, are accelerated to high speeds and kept in a stable orbit using magnetic fields. The particles circulate within the ring repeatedly, allowing them to undergo multiple interactions and experiments. In such particle accelerators, electrons are typically arranged close together in a controlled manner, forming bunches to optimize their behavior and interactions. It’s called electron bunching.
The SSMB (Steady-State Micro-Bunching) EUV light source offers several advantages：
In the end, what the Chinese scientists are actually working on is not an EUV machine, but rather a whole new type of EUV lithographic complex that could produce leading-edge chips in high volume.
In 2017, Tang Chuanxiang and Chao launched the SSMB experiment. Tang's team and their German partners led the theoretical analysis, physical design, and laser system development, achieving initial proof of principle. Their seminal paper was successfully published in in February 2021.
Recognizing SSMB-EUV's importance for lithography R&D, China has since invested to construct a scientific facility in Xiong'an dedicated to SSMB research.
So SSMB-EUV is scientifically validated and engineering efforts are underway. The research team is committed to realizing SSMB-EUV, with ample funding approved. However considerable obstacles persist before industrial EUV lithography with SSMB can be achieved. Tempered expectations are prudent - the LPP-EUV approach took over 20 years from concept to implementation.
Nonetheless, under US pressure, China is compelled to aggressively pursue creative solutions like SSMB-EUV, combining ingenuity and engineering. With sufficient perseverance and resources, breakthroughs may not be so distant. This could be a game changer if China makes it work.
SSMB is the more advance and will be probably the one who power future China EUV machines but is not the only project because according the research literature synchrotron-EUV lithography and conventional EUV FEL project is underway.
China May Be Constructing EUV Lithography Machines on a Massive Scale
Under US pressure, China is compelled to aggressively pursue creative solutions like SSMB-EUV. This could be a game changer if China makes it work.
In a remarkable paper titled “, published in the Chinese journal Acta Physica Sinica, scientists from Beijing’s Tsinghua University propose a plan to build an accelerator the size of a football field and use it as a light source for a few dozens of EUV machines working simultaneously. The accelerator in question is a circular ring-shaped device where charged particles, such as electrons or protons, are accelerated to high speeds and kept in a stable orbit using magnetic fields. The particles circulate within the ring repeatedly, allowing them to undergo multiple interactions and experiments. In such particle accelerators, electrons are typically arranged close together in a controlled manner, forming bunches to optimize their behavior and interactions. It’s called electron bunching.
The SSMB (Steady-State Micro-Bunching) EUV light source offers several advantages：
- Firstly, it provides high average power, thanks to the capability of the SSMB storage ring to accommodate multiple EUV beamlines. This allows for enhanced productivity and throughput in lithography processes.
- Secondly, the emitted radiation from the SSMB-EUV light source has a narrow bandwidth and high collimation. This means that the range of wavelengths is tightly controlled, resulting in highly focused and precise radiation. This characteristic is crucial for achieving high-resolution imaging and intricate patterning in lithography applications.
- Furthermore, the SSMB-EUV light source offers high stability continuous-wave output. The radiation is emitted continuously and maintains a consistent level of stability. This stability is essential for ensuring reliable and predictable performance in lithography processes, reducing variations, and improving overall quality.
- In addition, the emitted radiation from the SSMB-EUV light source is clean and devoid of impurities. This cleanliness is advantageous as it minimizes potential interference or contamination that could negatively impact the lithography process and the quality of the produced patterns.
- Lastly, the SSMB principle exhibits scalability. It can be easily extended to shorter wavelengths, which opens up possibilities for future advancements in lithography technology. For instance, it holds the potential for the utilization of Blue-X lithography technology, which operates at a wavelength of 6.x nm, in the next generation.
In the end, what the Chinese scientists are actually working on is not an EUV machine, but rather a whole new type of EUV lithographic complex that could produce leading-edge chips in high volume.
In 2017, Tang Chuanxiang and Chao launched the SSMB experiment. Tang's team and their German partners led the theoretical analysis, physical design, and laser system development, achieving initial proof of principle. Their seminal paper was successfully published in in February 2021.
Recognizing SSMB-EUV's importance for lithography R&D, China has since invested to construct a scientific facility in Xiong'an dedicated to SSMB research.
So SSMB-EUV is scientifically validated and engineering efforts are underway. The research team is committed to realizing SSMB-EUV, with ample funding approved. However considerable obstacles persist before industrial EUV lithography with SSMB can be achieved. Tempered expectations are prudent - the LPP-EUV approach took over 20 years from concept to implementation.
Nonetheless, under US pressure, China is compelled to aggressively pursue creative solutions like SSMB-EUV, combining ingenuity and engineering. With sufficient perseverance and resources, breakthroughs may not be so distant. This could be a game changer if China makes it work.
Yes, guy in the video definitely has some bias or he doesn't want to talk about the Chinese efforts because doesn't want controversy. Is just weird that in 2019 SSMB paper was published all over scientific press and he just ignored.
It's not good or bad so much as the policy is based on obviously flawed supposition. Unlike military goods like the J-20 which has wriggle room on numbers due of PLAAF's opacity the number of Huawei phones and laptops can very easily be tracked. It will not take long before everyone knows that the policy is based on a lie.
All the Japanese, Korean, American and Dutch in the chip industry- all together now : WE'RE F**k !
anyways, so overnight my time will be when the Huawei unveiling happens. Promise of this new brand (新品牌) ahead of time. It will be really interesting what that is.
They clearly picked this day for a reason. It is getting broadcasted by national TV. They are getting all the coverage they need.
As huawei whisper said, keep your eyes on these two items. I'm pretty excited about this. Aside from all the teasers we already know about, there will be more unveiling.
They clearly picked this day for a reason. It is getting broadcasted by national TV. They are getting all the coverage they need.
As huawei whisper said, keep your eyes on these two items. I'm pretty excited about this. Aside from all the teasers we already know about, there will be more unveiling.
Does anyone know if there is a public link to view the event? And the time.
do you really want to watch it? It's suppose to go for 3 hours from 2:30 pm china time
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