Any semi historians know cost/benefit analysis for ASML going with laser plasma over synchrotron? Seems like at 200million per tool, it's not particularly more economical than cost of synchrotron/SSMB. There's one article behind paywall "EUCLIDES: European EUVL Program" from 1999 with author including Jos Benschop, who as far as I can tell was instrumental to ASML EUV effort. An interview with him a few years ago basically TLDRed to synchrotrons expensive, so we went with laser plasma... followed by many paragraphs of subsequent engineering challenges. Which one would presume would inflate final costs. For reference PRC's latest large scale synchrotron facility HEPS under construction is 1.3km circumference, with 60+ beam lines for 90 tool/experiment stations, for ~700M USD. Meanwhile, Tsinghua SSMB light source conceptual design is about 1/10 the size. I know they're not analogous, but seems questionable if plasma route ended up more economical, only that it works regardless of sunk cost, and new nodes are increasingly less cost effective relative to capital costs. What am I missing here?
Getting a synchrotron big enough to provide meaningful power output for industrial use wasn’t practical. 60 beam lines at lower power output may translate to much fewer beam lines at the higher output you’d need for meaningful scanning speeds. Furthermore the large size of such a facility meant that setting up production would take a lot of construction time, and every time you wanted to expand production you’d need to build a whole new synchrotron which will involve greater time suck. The large facility size would also impose logistics and operations costs for the rest of the production line, since you’d need to cart wafers back and forth across the physical distances around such a large structure.Any semi historians know cost/benefit analysis for ASML going with laser plasma over synchrotron? Seems like at 200million per tool, it's not particularly more economical than cost of synchrotron/SSMB. There's one article behind paywall "EUCLIDES: European EUVL Program" from 1999 with author including Jos Benschop, who as far as I can tell was instrumental to ASML EUV effort. An interview with him a few years ago basically TLDRed to synchrotrons expensive, so we went with laser plasma... followed by many paragraphs of subsequent engineering challenges. Which one would presume would inflate final costs. For reference PRC's latest large scale synchrotron facility HEPS under construction is 1.3km circumference, with 60+ beam lines for 90 tool/experiment stations, for ~700M USD. Meanwhile, Tsinghua SSMB light source conceptual design is about 1/10 the size. I know they're not analogous, but seems questionable if plasma route ended up more economical, only that it works regardless of sunk cost, and new nodes are increasingly less cost effective relative to capital costs. What am I missing here?
I don't believe size of the synchrotron would be much of an issue because the vast majority of the machine would be placed in a subfloor and the final beam would be directed upwards into a floor with the lithography machine to minimize floor space usage.Getting a synchrotron big enough to provide meaningful power output for industrial use wasn’t practical. 60 beam lines at lower power output may translate to much fewer beam lines at the higher output you’d need for meaningful scanning speeds. Furthermore the large size of such a facility meant that setting up production would take a lot of construction time, and every time you wanted to expand production you’d need to build a whole new synchrotron which will involve greater time suck. The large facility size would also impose logistics and operations costs for the rest of the production line, since you’d need to cart wafers back and forth across the physical distances around such a large structure.
If you’re trying to redirect the beam to a different area where logistics and operations factors are easier to manage you’ll also need to contend with dispersion and light loss at larger distances I reckon, which compounds the sufficient output problem.I don't believe size of the synchrotron would be much of an issue because the vast majority of the machine would be placed in a subfloor and the final beam would be directed upwards into a floor with the lithography machine to minimize floor space usage.
Introduction.—In a radiation source driven by coherent
electrons, particles group into microbunches spaced at the
wavelength of the desired light. The resulting coherent
light can be orders of magnitude brighter than that of an
equivalent incoherent source. The free-electron laser
(FEL) process, for example, turns a constant stream of
electrons into a series of microbunches, which then radiate
coherently.
For high average power light sources, duty-cycle shares
the stage with coherence. Linac driven FELs use each
electron pulse once, leading to low duty cycles. (Energy
recovery linacs reach high duty cycles by recovering the
electron energy [1–3].) Storage rings, by contrast, naturally
provide MHz repetition rates, and fully filled rings can
provide cw radiation. However, storage rings do not generally
support sustained microbunching.
I don't believe size of the synchrotron would be much of an issue because the vast majority of the machine would be placed in a subfloor and the final beam would be directed upwards into a floor with the lithography machine to minimize floor space usage.
Synchrotrons and storage rings deliver radiation across the electromagnetic spectrum at high repetition
rates, and free electron lasers produce radiation pulses with high peak brightness. However, at present few
light sources can generate both high repetition rates and high brightness outside the optical range. We
propose to create steady-state microbunching (SSMB) in a storage ring to produce coherent radiation at a
high repetition rate or in continuous wave mode. In this Letter we describe a general mechanism for
producing SSMB and give sample parameters for extreme ultraviolet lithography and submillimeter
sources. We also describe a similar arrangement to produce two pulses with variable spacing for pumpprobe
experiments. With technological advances, SSMB could reach the soft x-ray range (< 10 nm).