Just want to say thank you for the continual updates. Keeping the conversations grounded on known facts and credible projections. It has been an exciting few weeks for Huawei, SMIC, etc….
Chinese semiconductor industry
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How do you know that they don't have it at SMIC? I know that there is a lot of activity regarding immersion lithography since mid 2022.
And the article has the name wrong, is 60W a ArFi laser instead of a 10W.
EUV is distinct effort than Immersion and very probably SMEE will not be the main player. A supply chain is forming in China around EUV.
I strongly wonder how well read you are about these topics.
This topic now is well and truly off topic from the thread and I might move these posts to the relevant thread soon but I think it is a good opportunity to see what you actually understand.
C919 was intended to be powered by LEAP-1C from the beginning as its initial powerplant, yes, with the domestic CJ-1000A to power it many years later. That was always part of the plan to begin with, with knowledge that the domestic civilian CJ-1000A would take a number of years to be ready.
However, when was the supply of LEAP-1C delayed for C919 that required it to have a multi-year delay?
Talking about lithography.
DR-SEM officially debuted
At this exhibition, Dongfang Jingyuan’s electron beam defect re-inspection equipment DR-SEM (model: SEpA-r600) was officially unveiled. This equipment can meet the defect review needs of 28nm and above logic, 3D-NAND, and DRAM processes. It has fully automatic review, structural perspective, and element analysis capabilities. The blessing of D2D algorithm gives the equipment an excellent capture rate . At present, the machine has been shipped to the client for production line verification, and multiple orders have been obtained. DR-SEM is another masterpiece of Dongfang Jingyuan in the field of electron beam detection, which is of great significance in increasing corporate competitiveness and industry influence.
Dongfang Jingyuan's computational lithography software PanGen breaks the monopoly of foreign technology and is the first OPC software in China that has been successfully applied in mass production at domestic mainstream logic and storage Fab advanced process nodes . The application of cutting-edge technologies such as CPU+GPU hybrid supercomputing architecture and reverse computational lithography ILT gives PanGen outstanding performance. At the same time, the PanGen computational lithography platform already has a complete functional chain, including accurate process simulation, DRC, SBAR, ILT, OPC, DPT and SMO. It can provide a complete set of computational lithography solutions and lead the development of related domestic fields.
If this little company triggered ASML then, I think, when SMEE "officially" announce the new line of Dual Wafer Working Stage line (which is an decade long ASML trademark) of scanners it will be an even bigger triggering.
DR-SEM officially debuted
At this exhibition, Dongfang Jingyuan’s electron beam defect re-inspection equipment DR-SEM (model: SEpA-r600) was officially unveiled. This equipment can meet the defect review needs of 28nm and above logic, 3D-NAND, and DRAM processes. It has fully automatic review, structural perspective, and element analysis capabilities. The blessing of D2D algorithm gives the equipment an excellent capture rate . At present, the machine has been shipped to the client for production line verification, and multiple orders have been obtained. DR-SEM is another masterpiece of Dongfang Jingyuan in the field of electron beam detection, which is of great significance in increasing corporate competitiveness and industry influence.
Dongfang Jingyuan's three electron beam inspection and measurement equipment that have been verified by the production line and entered mass production have significantly improved their product performance through continuous iterative upgrades. Electron beam defect inspection equipment EBI has been in full-automatic mass production of 28nm production lines for more than 2 years. Uptime exceeds 90%, UT (equipment utilization rate) exceeds 80%, electron beam pattern resolution, maximum field of view, key defect capture rate, etc. Key indicators have reached the mainstream level of the industry. CD-SEM, a 12-inch and 6/8-inch critical dimension measurement equipment, has been in mass production for a long time. It can support a variety of measurement scenarios such as Line/Space, Hole/Elliptic, LER/LWR, etc., and meet a variety of imaging needs . In addition, Dongfang Jingyuan CD-SEM also has the function of offline editing of recipes based on design layout files (optional). It is worth mentioning that the 12-inch EBI and 12-inch and 6/8-inch CD-SEM launched by Dongfang Jingyuan are the first in China, filling the gaps in related domestic fields.
Chip manufacturing EDA tools add two new members
Dongfang Jingyuan's computational lithography software PanGen breaks the monopoly of foreign technology and is the first OPC software in China that has been successfully applied in mass production at domestic mainstream logic and storage Fab advanced process nodes . The application of cutting-edge technologies such as CPU+GPU hybrid supercomputing architecture and reverse computational lithography ILT gives PanGen outstanding performance. At the same time, the PanGen computational lithography platform already has a complete functional chain, including accurate process simulation, DRC, SBAR, ILT, OPC, DPT and SMO. It can provide a complete set of computational lithography solutions and lead the development of related domestic fields.
If this little company triggered ASML then, I think, when SMEE "officially" announce the new line of Dual Wafer Working Stage line (which is an decade long ASML trademark) of scanners it will be an even bigger triggering.
And you know this how? Did you actually build a space station and then an EUV and compared how difficulty it is to build each in quantifiable terms?
I removed a bunch of rui009 and replying posts off this thread, which was clearly taking this thread off track. I would suggest that when someone is clearly trying to derail this thread in the future, you let the moderators know and we will take care of it.
also again for new members posting here, please read this thread through before posting your thoughts. It's not helpful to be so uninformed
I don't want to boast, but a lot of things we discussed here have been verified at a later point, so I will put this thread as much more reliable than Bloomberg
also again for new members posting here, please read this thread through before posting your thoughts. It's not helpful to be so uninformed
I don't want to boast, but a lot of things we discussed here have been verified at a later point, so I will put this thread as much more reliable than Bloomberg
It's not even a close comparison. One is a fairly free and rational platform for close scrutiny to separate facts from likely facts from plausible rumors from propaganda/fabrications. The other is a political propaganda outlet masquerading as business news. The problem is when we have so many people who join but were born and raised on propaganda that they naively believe is mostly facts, so they ridiculously assert that our confirmed and likely facts are fantasies, and their propaganda are facts. This is the root cause of most of the conflict here.
On the ground comparison between Apple and Huawei store traffic in Shanghai, seems the iPhone 15 hasn't arrived in the store yet for hands-on customer experience. The Huawei Mate 60 Pro andd Pro Plus on the other hand are available for people to test in-store:
Samsung store nearby as well but the uploader says they've been marginalized in China market so didn't even bother to visit.
Samsung store nearby as well but the uploader says they've been marginalized in China market so didn't even bother to visit.
SteelBird
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My question: why ASML cannot develop an EUV machine without US technology? If they could, they would be able to supply EUV to anybody they like.
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