Chinese semiconductor industry

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ansy1968

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A perfect candidate for SMIC N+1? but sadly it will be FAB by TSMC. :(

By CnTechPost

Baidu's 7nm AI chip Kunlun 2 to be mass-produced soon​

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February 18, 2021
Chinese search giant Baidu
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its in-house developed 7nm AI chip Kunlun 2 is about to be mass-produced to further enhance the arithmetic advantages of its AI cloud.
Kunlun 2's performance is said to be three times better than its predecessor, and Baidu said it will be deployed in areas including search, industrial internet, and intelligent transportation.
2021021810121650.jpg

(Source: Baidu)
Announced in 2018, "Baidu Kunlun" is China's first cloud-based full-featured AI chip developed by Baidu.
Kunlun 1 had been mass-produced more than 20,000 pieces and had achieved application deployment as of the middle of December 2020.
Baidu has been No. 1 in China for three consecutive years in terms of AI patent applications and licenses. Baidu AI open platform brings together 2.65 million developers, making it China's leading AI mass production platform with integrated hardware and software.
The strength of AI technology is bringing new profit growth for Baidu. The company announced today that its revenue rose 5% year-on-year to RMB 30.3 billion ($469 billion) in the fourth quarter of 2020, beating analysts' estimates of 30.06 billion yuan, according to IBES data from Refinitiv.
In the fourth quarter, Baidu AI Cloud revenue grew 67 percent year-on-year, with full-year revenue of about RMB 13 billion. Baidu has ranked first in AI Cloud market share three consecutive times, according to IDC.
 

nlalyst

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I believe Changchun is developing 4 Mirror Optics and using a 150W+ DPP EUV Light Source for the Production Model. They are still working on the Optics currently as far as i know.
How interesting that they went the DPP route. Do you have some source on this that you can share?
 

Oldschool

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Could you please clarify what in particular they achieved or what part of the system were they working on? Judging from the pictures alone, and the text's focus on '32nm lithography', their work doesn't seem to be related to EUV light generation.
The attached picture shows the enclosed vaccum chamber. The part on the upper left coming into the vaccum chamber , I believe is the EUV light source generation module. DPP EUV light at 13.5nm. The lower left part coming into chamber carrying wafer into the chamber.

Inside the chamber contains the mask, illumination optics and projection optics and wafer stage.

A block diagram of that is enclosed.

Basically it contains all the elements for am EUV lithography.

It capable of doing 22-32nm resolution .

The EUV generation module is not shown in the video. The picture got part of generation module cut off. It only shows the vaccum chamber and the part of the generation module coming into the chamber.

This prototype has less number of projection mirrors than ASML machine.
 

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Oldschool

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@WTAN @Oldschool

I'm not an engineer by profession, but watching the video and comparing it to ASML EUVL, The Chinese concept design is simpler and different? because its an experimental machine? or maybe with future refinement will be similar in design? your opinion please?
Concept is same. They have same type of elements. It just that ASML has more levels of mirrors in it's projection optics and there fore higher resolution.. That along with higher EUV power will give higher resolution. ASML capable of 5nm-7nm while China first prototype capable of 22nm-32nm

The first prototype demonstrate all the needed elements for an EUV system.

Now just need to pump up the power and enhance the projection mirror system.
 

ansy1968

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Concept is same. They have same type of elements. It just that ASML has more levels of mirrors in it's projection optics and there fore higher resolution.. That along with higher EUV power will give higher resolution. ASML capable of 5nm-7nm while China first prototype capable of 22nm-32nm
Thanks @Oldschool appreciated, another question, so if the concept is the same, China had the basic foundation right therefore their EUVL program in a sense is deliverable only waiting for the Critical parts such as the light source and adding advance optics?
 

Oldschool

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Thanks @Oldschool appreciated, another question, so if the concept is the same, China had the basic foundation right therefore their EUVL program in a sense is deliverable only waiting for the Critical parts such as the light source and adding advance optics?
The prototype has all the elements including light source But it's only capable of 22nm to 32nm.

This article shows harbin institute of technology 's DPP-EUV light source.

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nlalyst

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The attached picture shows the enclosed vaccum chamber. The part on the upper left coming into the vaccum chamber , I believe is the EUV light source generation module. DPP EUV light at 13.5nm. The lower left part coming into chamber carrying wafer into the chamber.

Inside the chamber contains the mask, illumination optics and projection optics and wafer stage.

A block diagram of that is enclosed.

Basically it contains all the elements for am EUV lithography.

It capable of doing 22-32nm resolution .

The EUV generation module is not shown in the video. The picture got part of generation module cut off. It only shows the vaccum chamber and the part of the generation module coming into the chamber.

This prototype has less number of projection mirrors than ASML machine.
Thanks! Did they publish how many wafers-per-hour they achieved with this setup?
 

Oldschool

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Thanks! Did they publish how many wafers-per-hour they achieved with this setup?
they didn't say. Only spells out the output of their DPP-EUV module is within the range from 115W - 180W of EUV, which is a wide range.
Whereas ASML EUV equipment has an output of 200W of EUV.

At the time of their project, no industrial guys come banging at their door. What they did is for research purpose.
It wasn't late last year that Huawei founder ren came visit CAS to ask for a solution. If there's no sanction from US no domestic companies would ask their research project turning into industrial grade product..
 
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Hendrik_2000

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they didn't say. Only spells out the output of their DPP-EUV module is within the range from 115W - 180W of EUV, which is a wide range.
Whereas ASML EUV equipment has an output of 200W of EUV.

At the time of their project, no industrial guys come banging at their door. What they did is for research purpose.
It wasn't late last year that Huawei founder ren came visit CAS to ask for a solution. If there's no sanction from US no domestic companies would ask their research project turning into industrial grade product..
Yup that is the problem with Chinese semiconductor industry They are so naïve and lack of for planning for the future and totally ignorant of geopolitic typical of management only interested in profit, flash. There is nothing wrong with government effort or Chinese scientist they are as good as anybody But without big moolah nothing get done This technology restriction is silver lining suddenly they wake and open their eye wide open
 

weig2000

Captain
they didn't say. Only spells out the output of their DPP-EUV module is within the range from 115W - 180W of EUV, which is a wide range.
Whereas ASML EUV equipment has an output of 200W of EUV.

At the time of their project, no industrial guys come banging at their door. What they did is for research purpose.
It wasn't late last year that Huawei founder ren came visit CAS to ask for a solution. If there's no sanction from US no domestic companies would ask their research project turning into industrial grade product..

That's typical of China: they almost always have some parallel state-funded R&D initiatives for strategically important technologies, which can turn into Plan B or "spare tire" when needed.
 
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