Chinese semiconductor industry

PopularScience said:

havoc：首台样机21年6月就完成了。光刻机是02重大专项的子课题，由谁来验收可以参考当年90nm光刻机的验收情况。

The first prototype of immersion DUV was completed in June 21. The lithography machine is a sub-project of the 02 major special project. Who will check and accept it can refer to the acceptance of the 90nm lithography machine in that year.

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tokenanalyst said:

The latest progress of soft X-ray interference lithography at Shanghai Light Source. (2020)​

2. Research Background

Soft X-ray interference lithography (XIL) technology is a new type of advanced micro- and nano-processing technology that uses the interference fringes of two or more coherent soft X-ray beams to expose photoresists, and can carry out dozens or even dozens of nanometer cycles. nanostructure processing. Compared with other methods such as lithography, XIL technology has the advantages of high resolution, no proximity effect, no pollution, and high output. It can more reliably obtain large-area, high-quality sub-50nm high-density periodic nanostructures. The soft X-ray interference lithography line station of Shanghai Light Source was opened to users in 2013. The construction of this line station aims to take advantage of the advantages of low emissivity, high brightness and high coherence of soft X-rays to establish a high-efficiency, low-cost, high-precision nano-processing technology platform at Shanghai Light Source. Internationally, the XIL-II line station of the Swiss light source and the BL-9 line station of the New SUBARU light source in Japan have carried out a lot of related research work based on this technology. Researcher Wu Yanqing gave a detailed introduction to the recent work done by Shanghai Light Source's XIL line station on the development of this technology.

3. Latest progress

The soft X-ray interference lithography line station of Shanghai Light Source has established a set of accurate vibration evaluation system based on laser interferometer. The quantitative evaluation of the vibration of the exposure system provides guidance for the subsequent vibration reduction methods, and finally the vibration of the exposure system of the experimental station is controlled below the RMS value of 2.5 nm, laying a good hardware foundation for the interference exposure experiment. On this basis, the line station has developed experimental methods such as high-order diffraction interference lithography, large-area stitching depth exposure, and parallel direct writing Taibao lithography. The exposure resolution, exposure depth, and exposure area of the line station have been improved, and the exposure of complex periodic graphics has also been realized.

The high-order diffraction interference lithography method is an exposure method using second-order and above-order diffracted beams for interference lithography, which can realize the reduction of the exposure pattern period by 1/4 of the original mask lithography period. As shown in Figure 1. The current pattern half period (HP) is about 25nm. This technique has been used for EUV photoresist inspection.

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The EUV Parallel Direct-Writing Taibao Lithography Method

describes a parallel direct-write lithography method based on a nano-displacement platform to achieve the exposure of strict periodic patterns of complex cells. As shown in Figure 3. This technology can be used for metasurface research and application.

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Interesting use of X-Ray lithography techniques.

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FairAndUnbiased said:

not the west. Really, its just Taiwan and South Korea, who both buy foreign tools, making foreign designs, and have little tool or chemical capability of their own. Not much design either except MediaTek. Rest of them have extremely limited capability in semiconductor.

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pbd456 said:

how did the 90nm machine verify?

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PopularScience said:

Another rumor from reputable source. High end Huawei Kirin 9 series will be returned in second half of this year. SMIC's 7nm.

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tokenanalyst said:

Yawei Co., Ltd.: The photoresist main material products of the joint stock company have achieved breakthroughs in orders from domestic customers​

On the evening of March 17th, Yawei shares stated on the interactive platform: "The photoresist main material products of Weimai Core Materials, which the company participates in, have achieved breakthroughs in orders from domestic customers. The joint venture company Yawei Aios is Gradually obtain the direct supplier qualification of major domestic customers, and the products on the module side have been delivered to customers in batches, and we have mastered complete capabilities."

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tokenanalyst said:

Is possible to convert dry machines into immersions ones, I think the first production immersion machines where dry to immersion conversions, you wont get 1.35 NA because current immersion machines have dedicated projection lens systems for that but the NA will be above 1. In fact the first plan of SMEE was to adapt an immersion system to their dry 90nm Arf Scanners to allow the system to pattern to 65nm.
That part that I still don't getting is the part of adapting dual wafer stage to a single wafer stage machine. I don't know but dual wafer stages have different vibration mechanics than single wafer stages but guess they could add some adaptations to get it to work.

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