Someone posted a chart from ASML here once that showed the major difference between DUVi machines wasn't power source output or numerical aperture of the optics, but the accuracy of the workpiece. Given the progress posted here regarding China's grating interferometers, I'm positive this won't be a bottleneck going forward.
You mean the MMO, you can see that SSA 800 28 DUVL had the same MMO with ASML NXT 1980i.
DUV product portfolio to support all market segments 29 Sept. 2021 Slide 9 NXT:2100i
1.3 nm | 295wph NXT:2050i
1.5 nm | 295wph
NXT:1980Ei 2.5 nm | 295wph NXT:2000i
2.0 nm | 275wph NXT:1980Di
2.5 nm | 275wph ArF XT:1460K 5 nm | 205wph or 7.5 nm| 228wph 1.35 NA, 38 nm 0.93 NA, 57 nm XT:860N 7.5 nm | 260wph XT:1060K + PEP 5 nm | 220wph XT:860M 7 nm** | 240 - 250wph XT:1060K 5 nm | 205wph 0.93 NA, 80 nm 0.80 NA,110 nm i-line XT:400M 2
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@WTAN
The stated MMO of SMEE DUVL is 2.5nm
The MMO of ASML 1980i is 2.5nm
The MMO/CMO of 2000i is 2.5nm
The MMO/CMO of 2050i is 2.5nm
The 2000i and 2050i have a ORION Alignment Sensor so the MMO is probably better than 2.5nm.
I would say that the SMEE 28nm DUVL is broadly equivalent to the 1980i.
Based on the SMEE MMO of 2.5nm which is similar to that of the 1980i, it should be able to do the 14nm process with Multi Patterning.
The 1980i is used by SMIC in China to produce 14nm ICs and the N+1(8nm) and N+2(7nm).
TSMC may have used the 1980i to produce their DUVL 7nm ICs.
SMEE will no doubt seek to improve the Overlay Accuracy of their DUVL so that it can match the latest NIKON DUVL in order to enable the production of 5nm ICs.
They should be able to achieve this as their MMO is already quite advanced by ASML and NIKON standards.
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