From the researches I made on the web below is a summary of the technological level of Chinese semi equipment makers for some of the major steps:
Lithography:
Smee. 28nm (to be confirmed) possibly 7nm with multiple exposures
Etching:
Amec. 5nm. 3nm under development
Naura. 14nm. 5nm under development
PVD:
Naura. 14nm. 5nm under development.
CVD:
Naura. 14nm. 5nm under development
Shenyang Piotech: 5nm
ALD:
Naura. 14nm. 5nm under development
Shenyang Piotech: 5nm
CMP:
Hwatsing 14nm.
Ion implanter:
CETC 28mm.
Metrology and defect inpection:
Several companies but not sure which node they are capable of.
I have probably firgotten some steps and would be helpful to add more steps/companies to the list.
The most common equipment for any nanotechnology and semiconductor industry characterization is focus ion beam (FIB} for minor structure edit/modification, use ion to chip away the materials. (SEM)scanning electron microscope for taking a picture.
FIB-SEM combo tool is very common equipment in industry. EUV also uses FIB for mirror surface smoothness milling.
Any Chinese company making that. If not , then it's a must have in the to do list.
Should be very doable , less difficult than lithography.