You seem to be the only person in this thread with anything even approximating relevant firsthand knowledge. When do you anticipate the first Chinese production-ready EUV lithograph being introduced?
Since the Government has decided to spend more funds on the development of the Semiconductor Industry, there is talk that the EUVL could appear sometime in 2025.
With the development of the 28nm DUVL, the Chinese Academy of Sciences didnt really play a big part in its development. SMEE and a consortium of companies basically played a major part in its development which was why it took a little longer to produce the DUVL.
With the EUVL, the CAS is actually playing a bigger part in its development as much of the technologies are new and costly to develop.
The CAS has organised a EUVL Alliance to attract companies that want to be involved in this project.
Huawei is also involved in this EUVL Alliance.
ASML has a similar Alliance which comprises of TSMC, Samsung, Carl Zeiss etc.