Amidst this influx of negative propaganda and its amplification by trolls here, this is a good opportunity to recap some facts about the state of the industry
* What this "something" is, hopefully @WTAN will clarify. The most pessimistic reading of the post I quoted is that this has to do with the EUVL light source (the CO2 MOPA laser and tin droplet assembly). However, since that is the most difficult part of the machine, progress on this front will solve the most critical bottleneck China is facing.
It's almost certain that China is working on other parts of the device in parallel, and I'd speculate that they're farther along given that they can be tested by ICRD in synchrotrons or other non-commercial EUV light sources.
Chinese semiconductor industry
AFAIK this one-year reprieve refers to Samsung and TSMC fabs in China that still can buy US tools, but it does not mean Samsung can sell advanced foundry services for Chinese AI customers. Samsung in China has a Dram fab. In the original Korea Economic Daily article is written Samsung will be...
www.sinodefenceforum.com
- China has stockpiled foreign DUV lithography tools sufficient down to 7nm (as SMIC proved).
- SMEE SSA800 will enter mass production next year and it is capable of 28nm.
- An improvement/successor to the SSA 800 with a more powerful laser capable of 7nm is, according to the most knowledgeable poster in this thread by far, "around the corner."
- SMEE and Huawei are confirmed to be developing EUV lithography tools (and I suspect they aren't alone) and "something"* is expected to emerge by 2025, barring unforeseen delays. So far, no delays of the sort have been noted.
- ICRD is currently testing a completely indigenous 14nm production line.
* What this "something" is, hopefully @WTAN will clarify. The most pessimistic reading of the post I quoted is that this has to do with the EUVL light source (the CO2 MOPA laser and tin droplet assembly). However, since that is the most difficult part of the machine, progress on this front will solve the most critical bottleneck China is facing.
It's almost certain that China is working on other parts of the device in parallel, and I'd speculate that they're farther along given that they can be tested by ICRD in synchrotrons or other non-commercial EUV light sources.
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