They probably will buy machines and tooling from SMEE. Let's see if SMEE have the balls to defy American sanctions.
I don’t think it’s likely to happen anytime soon. Not because of sanctions but to fulfill domestic demand and the localization push.
They probably will buy machines and tooling from SMEE. Let's see if SMEE have the balls to defy American sanctions.
Yeah I just posted the tweet because the reply was interesting. The articles are being posted because the negotiations haven't been working out as well and so it's a technique for the US to gain leverage. I wasn't trying to spam.It is all disinformation IMHO.
1) It is only Bloomberg reporting the same story. They first reported the anonymous sources, now the same Bloomberg following up on it.
2) The original story said that the Dutch authorities will agree to the ban next month, after two Dutch ministers said the opposite the past two weeks. The problem here is the calendar. For non-white people, we all have to remember that this is the Christmas holiday, and no one in government is going to do any work at all. By suggesting next month, all that is doing is trying to keep this story alive. It could be dead for all we know.
3) Besides, this was done all ass-backwards anyways. The Americans announced their IC bans against China unilaterally, because no one else wanted to go along with it. US officials publicly on record stating no one else is with them at this time, but they expect them to comply later. Surely, attempts were made to have those allies comply now, which were totally rejected. By suggesting there is a ban coming, at this stage of the game, seems more like damage control.
There is some confusion here. And I heard only about Russian investment into lithography machines and nothing about other machines.2022 is already ending, so where are at least rumors on all the necessary equipment - litho, etching, ion implantation, etc.? Litho grants for 350 nm machines were aimed for 2024, so how local 90 nm can even happen in 2022? Unless "localize" means buying from China.
Update: I checked and the grant was actually for 350 nm machines. The research for 130 nm one is supposed to finish by mid-2026.
No, the 350 and 130 nms are about the nodes, not light source wavelengths. For example, the grant's name for the 350 nm litho machine is called:The "nm" the Russians talk about in the lithography projects is the light source wavelength, it has nothing to do with semiconductor process and transistor size.
where the latter part is translated asРазработка, изготовление комплекта стендового оборудования, разработка и освоение в производстве установки и технологического процесса проекционного переноса изображений топологического рисунка ИС на пластину (Step&Repeat) в обеспечение производства ИС, ЭКБ с проектными нормами 350 нм
The 130 nm litho machine grant even explicitly mentions the development of 193 and 248 nm light sources, and separately that the litho machine should ensure minimum structural element sizes of 130 nm:... allowing production of IC, ECB (electronic component base) with design standards of 350 nm
Regarding the other machines - there were also grants for etching and ion implantation equipment plus maskless lithography.Разработка и изготовление установки проекционного переноса изображений топологического рисунка ИС на пластину (Step&Repeat) и источников излучения с длиной волны 193 и 248 нм, постановка базовых технологических процессов проекционного переноса изображений на пластину (Step&Repeat) с размером минимального конструкционного элемента 130 нм
There is a lot of semiconductor manufacturing equipment that need to be made at those nodes. oxidation, implantation, etching, deposition, lithography, rapid thermal processing, annealing equipment,CMP, cleaning-wet processing, metrology, testing, packaging. And is not just one in every category, like for etching you have dielectric etching, oxide etching, metal etching. Multiple types of deposition equipment. Different types of metrology equipment, CD-SEM, thin film measurement, optical measurament. Lithography needs track equipment support, aligment equipment, coating, developing, ashing. And that is not counting silicon ingot- wafer making equipment Clean room equipment. ultraPure water processing and pure chemical delivery equipment.There is some confusion here. And I heard only about Russian investment into lithography machines and nothing about other machines.
The "nm" the Russians talk about in the lithography projects is the light source wavelength, it has nothing to do with semiconductor process and transistor size.
Yes. I am so sick of these poor in data and heavy in narrative articles. A proper market analysis article has a lot of data and little to no subjective comments. Anything else is marketing.Finally.
Any idea when next year SSA800 will enter production?Amidst this influx of negative propaganda and its amplification by trolls here, this is a good opportunity to recap some facts about the state of the industry
Chinese semiconductor industry
AFAIK this one-year reprieve refers to Samsung and TSMC fabs in China that still can buy US tools, but it does not mean Samsung can sell advanced foundry services for Chinese AI customers. Samsung in China has a Dram fab. In the original Korea Economic Daily article is written Samsung will be...www.sinodefenceforum.comIn conclusion, if everything is cut off from China today, it has enough tools stockpiled to continue until domestic tools can pick up the slack. At worst, some expansion plans will have to be delayed by a year or two.
- China has stockpiled foreign DUV lithography tools sufficient down to 7nm (as SMIC proved).
- SMEE SSA800 will enter mass production next year and it is capable of 28nm.
- An improvement/successor to the SSA 800 with a more powerful laser capable of 7nm is, according to the most knowledgeable poster in this thread by far, "around the corner."
- SMEE and Huawei are confirmed to be developing EUV lithography tools (and I suspect they aren't alone) and "something"* is expected to emerge by 2025, barring unforeseen delays. So far, no delays of the sort have been noted.
- ICRD is currently testing a completely indigenous 14nm production line.
* What this "something" is, hopefully @WTAN will clarify. The most pessimistic reading of the post I quoted is that this has to do with the EUVL light source (the CO2 MOPA laser and tin droplet assembly). However, since that is the most difficult part of the machine, progress on this front will solve the most critical bottleneck China is facing.
It's almost certain that China is working on other parts of the device in parallel, and I'd speculate that they're farther along given that they can be tested by ICRD in synchrotrons or other non-commercial EUV light sources.