I hope that they succeed sooner rather than later.... DUV and EUV lithography is extremely difficult... In as much as one hopes for miracles and a sudden observation and identification of a missing step necessary to complete a process, this stuff ain't easy...I thought it would be good to summarize the present state of the Chinese lithography industry at this point of YOOL 2022:
DUV:
EUV:
- The SSA800 has met expectations (or disappointed them, depends who you ask) and delivered to customers for 28nm production. It is roughly comparable to an ASML NXT:1980Di. China has achieved completely indigenous 28nm volume production.
- The SSA800 is expected to be used in 14nm production through multipatterning next year.
- A follow-on DUVL machine (name unknown) using a more powerful light source and improved workbench for single exposure production of 22nm and multipatterning of 7nm (perhaps 5nm?) is expected Soon™. Expected to be comparable to ASML NXT:2050i.
I'd welcome the inputs, thoughts, and critiques of knowledgeable members like @WTAN, @tokenanalyst, and @FairAndUnbiased.
- There were some rumours of a 150W DPP EUVL tool supposed to be released around now. Obviously, no such thing has materialized, which means it's A) very secretive or B) as I suspect, DPP is not a viable path to commercial EUV.
- Everything about LPP EUV is a black box (at least in comparison to DUV). No word on the status of the CO2 laser, the optics, etc. All we "know" is that a machine should be ready around 2025.
- SSMB is a very interesting dark horse, but I don't think it's in the running for China's first generation EUVL. If it lives up to its promise, it would be a vast improvement over LPP EUVL and China would gain enormous advantages from getting to it first.