JiCui Huake semi-automatic wafer measuring machine was officially delivered to the leading international packaging company
On August 2nd, the ZEUS-W300 semi-automatic wafer measuring machine of JiCui Huake completed the packing and delivery, and was officially delivered to the leading international packaging company.
ZEUS series wafer measuring machines are independently developed by JCHUAKE Measuring Equipment Division. They are aimed at high-precision optical three-dimensional topography measurement in the IC industry. ZEUS-W300 semi-automatic and ZEUS-W300A automatic products have been formed, serving compound semiconductor, silicon-based The front/rear section of the device, LED, optical communication and other fields.
The main features of ZEUS series wafer measuring machine are as follows:
(1) Modular definition + personalized customization
Through a variety of combinations of 3D&2D probes, sensors, robotic arms, etc., the optimal non-contact measurement solution is provided to solve customers' troubles in complex measurement; the built-in motion execution system can be used according to customers' requirements for different motion configurations and different motion strokes. Needs, easy combination to achieve personalized customization.
(2) Self-developed measurement software driven
ZEUS series wafer measurement machine adopts the measurement software independently developed by JCI, which has a number of unique advantages.
- Adapt to a variety of probes and controllers;
- Supports measurement of various wafers such as light wafers, patterned wafers, wafers on saw frames, and multi-layer wafers, providing measurement functions such as wafer thickness, roughness, total thickness variation (TTV), total stack thickness, and warpage. ;
- It supports custom measurement process, can automatically take point measurement and save measurement mode and data, and can present various result forms such as data list, 2D drawing, 3D pseudo-color map and so on.
Self-developed measurement software
(3) Powerful white light interference technology The
application of white light interference technology can obtain relevant data of key dimensions such as the 3D topography, surface roughness, TSV and other key dimensions of the wafer surface, which can be used to determine the surface roughness, waviness, Surface topography features such as surface profile, surface defects, wear, corrosion, pore gaps, step heights, and machining conditions are measured and analyzed. The images below show examples of applications of this technology to measure different parameters on several different materials.
Application Cases: Semiconductors, Polished Wafers, Thinned Wafers, Wafer ICs
Application cases: 3C electronics, sapphire glass roughness, metal shell mold defects, glass screen height difference