Chinese semiconductor industry
- Thread starter Hendrik_2000
- Start date
- Status
Doubt it, Chinese fabs has always had a strong preference for ASML products probably due the strong Taiwanese influence in their semi industry. So if they are going to stockpile is going to be from ASML.
Perhaps, but still these FDPR are annoying and moving to fabs that are a mix of Chinese/Japanese equipment seems to be a possible way forward.
Probably even higher now.
Agree, that is the way to go
People no longer focus on EUV infrastructure readiness. 3nm risk production has been in progress for almost 3Q now, we are on the verge of 3nm HVM. Infrastructure for 3nm is set.
What you should be asking for is the HiNA EUV infrastructure readiness table.
Well, At least looks like TEL is getting.
Looks like Tsinghua is making progress on SSMB as an EUVL light source.
As a technology that Tsinghua is been maturing over the time could cut the necessity of complex EUV plasma infrastructure necessary per tool.
A ring maybe seem a bit big or complex but take into consideration that a single ring can in theory power multiple Kilowatts tools.
Let see what happens because necessity is the mother of invention.
As a technology that Tsinghua is been maturing over the time could cut the necessity of complex EUV plasma infrastructure necessary per tool.
A ring maybe seem a bit big or complex but take into consideration that a single ring can in theory power multiple Kilowatts tools.
Let see what happens because necessity is the mother of invention.
Is light source all that is missing for China's EUV?
It is way more complex than that. Just making the EUV lithography machine itself requires the light source, and optics. But then you also need all the associated infrastructure from testing tools, to other fabrication tools, ability to make your own masks, new materials, etc.
Because EUV uses a different part of the spectrum you cannot use the same materials for either masks, resist, or other materials.
Because EUV uses a different part of the spectrum you cannot use the same materials for either masks, resist, or other materials.
- Status