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[Hechuangnest · Chuangpin 100] Integrated circuit reticle defect detection product i6R: let reticle defects have nowhere to hide
Royal Micro Semiconductor: Reticle defect inspection product i6R
The i6R, the country's first integrated circuit mask defect detection product independently developed and launched by Yuwei Semiconductor, has reached the international advanced level in its key performance and has obtained the SEMI S2 certification of the Global Semiconductor Association. The product has surpassed foreign manufacturers with its excellent performance and stable performance. Monopoly, approved by TSMC, the world's largest integrated circuit manufacturer, and obtained repeated orders. At present, the products have been verified and used in the production lines of many integrated circuit manufacturers.
This product is mainly used to detect various common defects such as particles, oil stains, scratches on the upper surface and the lower surface of the reticle, and has a high detection rate and yield. Adopting high-resolution imaging, multi-mode lighting system, big data transmission, high-precision motion platform, high-efficiency multi-film library transmission, high-flow clean air bath and other technologies, the problems of low photomask detection efficiency, slow speed and poor process adaptability are solved. , has the characteristics of high resolution, high detection rate, high yield, particle cleaning, factory automation , etc., can accurately and quickly determine the location, size and shape of defects, more convenient for engineers to analyze and solve problems, and create value for customers.
