Chinese semiconductor industry

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manatee988

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mst said:
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Still, there are some cracks beginning to appear between some of the partners, in particular South Korea and the United States.

In an interview with the
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, Ahn Duk-geun, South Korea’s trade minister, said there were disagreements between Seoul and Washington over the latter’s continued export restrictions on semiconductor tools to China.

“Our semiconductor industry has a lot of concerns about what the US government is doing these days,” Ahn told the FT.

China, the world’s largest importer of chips, is a key market for chip companies globally, from U.S. giants like Qualcomm to Samsung in South Korea. With politics and business mixing, the stage could be set for more tension between nations in these high-tech alliances.

“Not all U.S. allies are eager to sign up for these alliances, or expand controls on technology bound for China, as they have major equities in both manufacturing in China and selling into the China market. Most do not want to run afoul of Beijing over these issues,” Triolo said.
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Creating a chip alliance that excludes the largest chip market?

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56860

56860

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gelgoog said:
I told you guys it was a bad idea to sell NAND to Apple. YMTC should at least have waited until they finished their own capacity expansion.
The Chinese market is large enough they do not need Apple for anything.

YMTC competes in lower end of the NAND market which is the place US Micron typically occupies but CN YMTC memory has better performance characteristics. This is all about keeping Micron in their position.
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And that's why you're a rando on SDF and not on the politburo. Thank god Chinese leaders aren't low T like you.
 
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tokenanalyst

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manatee988 said:
Creating a chip alliance that excludes the largest chip market?

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The thing with this type of multilateral crap is that dilute the ambitions of the participants between all the members, U.S. delusions to impose harsher sanctions may be in collision course with SK market reality and Japan economic reality.

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"no country can go it alone." I hate this cliche phrase that this "national security experts" use, has no meaning or even context.
5nm or 180nm? GPUs or analog chips?
 
FairAndUnbiased

FairAndUnbiased

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tokenanalyst said:
The thing with this type of multilateral crap is that dilute the ambitions of the participants between all the members, U.S. delusions to impose harsher sanctions may be in collision course with SK market reality and Japan economic reality.

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"no country can go it alone." I hate this cliche phrase that this "national security experts" use, has no meaning or even context.
5nm or 180nm? GPUs or analog chips?
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to me it looks like Canon is dead man walking and Nikon is just nearly dead. SMEE is on course to erode Canon's market share for legacy, analog, packaging, FPD and optoelectronics. I think their i-line machines are on par and KrF is only a little behind.

I'm hoping that SMEE launches a UV LED based replacement for i-line soon. The spectral purity and energy efficiency of 365 nm UV LED is far superior to i-line, and I'm honestly surprised that western companies are the ones who got started first.

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latenlazy

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tokenanalyst said:

Interesting research on LPP EUV light sources by this team in China​

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Abstract​

Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial requirements of new-generation semiconductor fabrication. The development of high-power EUV sources is a long-term critical challenge to the implementation of EUVL in high-volume manufacturing (HVM), together with other technologies such as photoresist and mask. Historically, both theoretical studies and experiments have clearly indicated that the CO2 laser-produced plasma (LPP) system is a promising solution for EUVL source, able to realize high conversion efficiency (CE) and output power. Currently, ASML's NXE:3400B EUV scanner configuring CO2 LPP source system has been installed and operated at chipmaker customers. Meanwhile, other research teams have made different progresses in the development of LPP EUV sources. However, in their technologies, some critical areas need to be further improved to meet the requirements of 5 nm node and below. Critically needed improvements include higher laser power, stable droplet generation system and longer collector lifetime. In this paper, we describe the performance characteristics of the laser system, droplet generator and mirror collector for different EUV sources, and also the new development results.

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advancing from 2015
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Do we know the dates that these papers were published on.
 
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