Chinese semiconductor industry

Status
Not open for further replies.

siegecrossbow

General
Staff member
Super Moderator
Great great great great news.

Before we celebrate too much at what is indeed a major breakthrough, do keep in mind that bitcoin mining machines don’t have the same requirement as consumer electronics like phones and tablets. At least as of last year it appears that SMIC is using MinerVa as a practice dummy for improving their 7nm recipe.
 

tokenanalyst

Brigadier
Registered Member
based on your assumption, then, yes, 15 SMEE SSA800.

But then you'll also need iLine, KrF, ArF systems from SMEE, too to make the 28nm chip in our example.
Still think the first batch of immersion machines whatever they come out is to meet the needs for chips of sanctioned companies like Huawei.

More concerning for ASML is the investment that e-town is making in mass-producing facilities for sub-systems, they are not making that investment for cosmetic reasons, they want to sell and a lot. I am just highly speculating here but given the modern geopolitical uncertainties thanks to U.S. Hawks, some groups inside China are seeing the need of a having a localized lithography industry, it may be tempting for the goverment to probably force the requirement of the use of SMEE tools, starting with dry tools (ArF dry, KrF, ILine) in Chinese goverment founded or subsidized projects. Any ban on immersion tools will only accelerate that decision. If that happen ASML will be stuck between a rock and hard place. Again I am highly speculating. But is logical.
 

PopularScience

Junior Member
Registered Member
It varies between DRAM, Logic, 3D-NAND and also between nodes. If we are talking SMIC's new Beijing fab, then it'll need something like 1 million to 1.3M exposures per month. So number of tools required would depends on how many exposures SMEE SSA800 can pump out per month (this would depend intrinsically on the SSA800's wafer-per-hour capability, its uptime, & the fab's utilization).

I don't know what SSA800's specification is so can't speculate.

For ASML, I found this on semiwiki.com:

View attachment 93690

If we take 2019 data, take median number, then I estimate up to 10 ASML immersion systems needed.

For SMEE, again, I don't want to get into trouble and accused of being biased. So allow me to trouble you to do your own speculation & math based on how fast you think SSA800 is relative to ASML's tool. ; )
But you don’t have to use the most advanced machine for every exposure. I I guess 5 DUVi maybe enough for advanced node.
 

hvpc

Junior Member
Registered Member
But you don’t have to use the most advanced machine for every exposure. I I guess 5 DUVi maybe enough for advanced node.
I was talkng only about the critical layers that require immersion. There are like three times more layers that needs iLine/KrF/ArF that are not part of my estimate.

I did a quick search on the web and found this:
Please, Log in or Register to view URLs content!
.

Look under the "mask set" section:
"A complex device would require more masks. A 10nm optical mask may require 76 individual masks, compared with roughly 46 for a 28nm node mask."

the number of litho steps for 28nm provided in the article is lower than my estimates but pretty close.
 
Last edited:

gadgetcool5

Senior Member
Registered Member
Ok so this 7nm chip has been out since July 2021 but we are suddenly getting all these mainstream reports about it now, right before a major political push in the US Congress for the CHIPS Act and as there is bureaucratic tussling in the Biden administration for more sanctions on Chinese chipmakers. It seems clear this is all a part of a lobbying push on the part of techno-nationalist US forces to buff up the perception of Chinese capabilities in order to win political battles at home. It may result in more sanctions against China.
 
Status
Not open for further replies.
Top