I remember reading how Russians working at ASML were key to many many breakthroughs so I wouldn't put it past them to come up with such an nifty system .A casual look at LinkedIn's ASML employees you'll find so many Russian names
Chinese semiconductor industry
- Thread starter Hendrik_2000
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Interesting.
The title of this article is clearly misleading. I listened in tsmc's quraterly report and investor call, they never said they will trim the expansion plan. What was said about the lower CapEx spent is due to supplier's delayed tool delivery. They also said there's no change to expansion plan and that they will have another good year in 2022 and expects same in 2023.
At one point in time, my previous employer was also evaluating Mapper' Lithography's multibeam solution as an alternative to EUVL. At the end of the day, EUVL won out, Mapper went bankrupt then ASML bought them a few years ago.
ASML bought Mapper for its IP and the service of its many Russian employees. I think a big part of Mapper was based in Russia (it was a JV between Russian & Deft University, I think)..
Laser creates semiconductor wafer "exclusive ID card"
With the continuous development and progress of technology, the semiconductor industry has higher and higher requirements for the quality of wafers, and the quality control of wafers is more stringent. In order to meet the needs of quality control and process improvement, it is also convenient to manage and track the wafers in the subsequent production, testing and packaging processes to ensure the stable traceability of the wafers, and can be clearly marked on the surface of the wafer or die character, one-dimensional code or two-dimensional code and other specific identifiers. Usually, the logo contains information such as the wafer manufacturer code, some technical parameters, and the serial number of a single wafer, which is equivalent to the "ID card" of the product.
In order to achieve time traceability, the mark must be able to be read at all times during the process, which places higher requirements on the wafer marking machine.
Laser marking uses a high-energy beam to irradiate the workpiece non-contact. While quickly completing the marking instructions, it can ensure the original accuracy of the workpiece and avoid pressure damage to the workpiece. At the same time, it has environmental protection, no consumables, high precision and high efficiency. Therefore, it is more in line with the high-quality marking requirements of wafers. The processing principle of wafer laser marking is not fundamentally different from common laser marking.
The wafer laser marking machine independently developed by Han’s Semiconductor can meet the requirements of precise laser marking on the wafer , and can mark the wafer surface of different materials. Different types of lasers are used according to the difference of product materials, and are equipped with high-speed scanning vibration. Mirror, Robot dual-arm manipulator, wafer aligner, to achieve the purpose of high speed, high precision, good effect and stable performance. According to the user's product size requirements, Han's Semiconductor can provide corresponding models from 2 inches to 12 inches.
Semiconductor automatic wafer marking machine
0 1Processing capacity1. Wafer materials: Si, SiC, InP, GaSb, GaN, sapphire, Glass, LT and other materials;2. Compatible with multiple wafer sizes: 2-6 inches, 4-8 inches, 8-12 inches;3. Marking position: front, back (including permeable membrane), double-sided;4. Wafer carrier: material box, Loadport (support FOUP, FOSB);5. Character type (in line with SEMI standard):• Letters ABC etc.• Number 123 etc.• Barcode BC-412 SEMI T1• QR code QRDM (optional)• Characters include dot matrix method (5x9 single line density / 10x18 double line density)0 2The main parameters
Under the current general trend of accelerated transformation and upgrading of domestic advanced manufacturing industries, Han's Semiconductor has always taken independent innovation as the foundation of sustainable development with its leading technology and quality advantages, continued to maintain a forge ahead trend, dig deep into the market supply, and expand the scope of services. Taking market demand as the starting point, it provides a steady stream of system processing and intelligent workshop solutions for the pan-semiconductor industry, and is committed to enhancing the international competitiveness of my country's equipment manufacturing industry.
Then is not a direct writing system but a maskless projection system instead. According the patent its seems that instead of a DMD they will use a light modulator (some kind of LCOS system). That will increase the throughput but could decrease the resolution to the resolution of the light modulator depending of the tricks they use, similar to the ones that this Chinese researchers did to overcome the resolution limit of their system.
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Actually, "DS uses a micromirror-type spatial light modulator (SLM) to create the “mask” pattern combined with a solid-state laser with wavelength of 193 or 248 nm. "
I did a quick search, the only thing I found on SLM is this:
SLM is actually pretty common. You can look in slides 7 - 11 for illustrations of what SLM is and how it works.
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Huawei Becomes Founding Member of Sisvel Wi-Fi 6 Patent Pool
According to Weibo news, Huawei officially announced today (19) that it has joined the Sisvel Wi-Fi 6 patent pool as a founding member, through which users can obtain Wi-Fi 6 standard essential patent licenses from Huawei and other pooled patent holders. , and Huawei Wi-Fi 6 products are also licensed by the patent pool.
Fan Zhiyong, director of Huawei's Intellectual Property Department, said: "Huawei hopes and is willing to share our innovative technologies in the Wi-Fi field with the industry. Wi-Fi technology is widely used in consumer electronics, smart homes, industrial enterprises and other fields. The patent pool can increase the number of patents. Licensing transparency and reducing licensing disputes. Users can obtain licenses for all patents in the patent pool at one time, improving licensing efficiency and reducing licensing costs.”
Previously, Fan Zhiyong pointed out at the "Exploring the Vision of Innovation: 2022 Innovation and Intellectual Property Forum" that Huawei is actively discussing the establishment of a new patent pool in the Wi-Fi field, which is expected to provide one-stop patents for more than 3 billion Wi-Fi devices.
Apart from Han's laser, there are few other 300-mm/12-inch class automatic laser wafer marking machine companies in China.
* Laiming Laser (Suzhou) -
* Teyan Semiconductor (Shenzhen) -
* Guoyu (Shenzhen) -
The generally considered World leader in this field are
America - Coherent and MKS
Japan - TOWA
Germany - INNOLAS
Taiwan has E&R while Korea also has a company called "Tech In Spirit"
that can manufacturer upto 8-inch capable machine.
The quality of an automatic laser wafer marking machine depends on
- laser power output depending the gain medium (fiber laser or solid state laser etc.)
- wafer dimension in mm*mm
- precision
- OCR software
* Laiming Laser (Suzhou) -
* Teyan Semiconductor (Shenzhen) -
* Guoyu (Shenzhen) -
The generally considered World leader in this field are
America - Coherent and MKS
Japan - TOWA
Germany - INNOLAS
Taiwan has E&R while Korea also has a company called "Tech In Spirit"
that can manufacturer upto 8-inch capable machine.
The quality of an automatic laser wafer marking machine depends on
- laser power output depending the gain medium (fiber laser or solid state laser etc.)
- wafer dimension in mm*mm
- precision
- OCR software
Another significant breakthrough
The "Vertical Self-Aligned Gate Ring Transistor Integrated Manufacturing Technology" project of the research group of Zhu Huilong, a researcher at the Integrated Circuit Leading Process R&D Center of the Institute of Microelectronics, Chinese Academy of Sciences, recently won the grand prize in the first National Disruptive Technology Innovation Competition hosted by the Ministry of Science and Technology. Final winner award.
The gate-all-around field effect transistor (GAA FET) is one of the important configurations for the evolution of advanced semiconductor manufacturing processes. According to reports, the research group of Zhu Huilong at the center has carried out systematic patent layout and research and development on the basic devices and key processes of this configuration. , proposed and realized the world's first stacked vertical nano-ring gate transistors (Vertical Sandwich Gate-All-Around FETs or VSAFETs) with self-aligned gates. New vertical nano-gate ring transistors (Vertical C-channel FETs or VCCFETs) with crystal channel size, the new vertical transistors can achieve nano-scale control of many key device geometric parameters, and the accuracy is better than existing advanced lithography and etching technology Level. (Proofreading/Lechuan)
The GAA FET achievements of the Chinese Academy of Sciences won the winner of the first National Disruptive Technology Innovation Competition of the Ministry of Science and Technology
The "Vertical Self-Aligned Gate Ring Transistor Integrated Manufacturing Technology" project of the research group of Zhu Huilong, a researcher at the Integrated Circuit Leading Process R&D Center of the Institute of Microelectronics, Chinese Academy of Sciences, recently won the grand prize in the first National Disruptive Technology Innovation Competition hosted by the Ministry of Science and Technology. Final winner award.
The gate-all-around field effect transistor (GAA FET) is one of the important configurations for the evolution of advanced semiconductor manufacturing processes. According to reports, the research group of Zhu Huilong at the center has carried out systematic patent layout and research and development on the basic devices and key processes of this configuration. , proposed and realized the world's first stacked vertical nano-ring gate transistors (Vertical Sandwich Gate-All-Around FETs or VSAFETs) with self-aligned gates. New vertical nano-gate ring transistors (Vertical C-channel FETs or VCCFETs) with crystal channel size, the new vertical transistors can achieve nano-scale control of many key device geometric parameters, and the accuracy is better than existing advanced lithography and etching technology Level. (Proofreading/Lechuan)
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