China Micro (AMEC): Etching, MOCVD, Thin Film Deposition, EPI go hand in hand
Event: On March 29, the company released its 2021 annual report, with revenue of 3.108 billion yuan, a year-on-year increase of 36.7%; net profit attributable to the parent of 1.011 billion yuan, a year-on-year increase of 105.5%; The profit was 324 million yuan, a year-on-year increase of 1291%; the new signing in 2021 was 4.13 billion yuan, an increase of about 1.96 billion yuan compared with 2020, an increase of about 90.5% year-on-year.
The revenue of etching equipment increased by more than 50%, and the gross profit margin of MOCVD increased significantly. Benefiting from the development of the equipment market and the competitive advantages of the company's products, the revenue of etching equipment in 2021 will be 2.004 billion yuan, a year-on-year increase of about 55.4%, and the gross profit margin will reach 44.32%. MOCVD revenue was 503 million yuan, an increase of 1.5% year-on-year, mainly due to downstream market reasons and the newly signed Mini LED MOCVD orders this year have not contributed to revenue, but the gross profit margin reached 33.77%, compared with 18.65% in 2020. Greatly improved.
Etching orders have grown steadily, the market share of CCP equipment has continued to increase, and ICP process research and development has moved towards advanced processes. In 2021, the company will produce and ship 298 cavities of CCP etching equipment, with the output increasing by 40% year-on-year, and the market share of some customers has entered the top three. The equipment is widely used in 64-layer and 128-layer 3D NAND production lines. With the rapid increase in the production capacity of 3D NAND chip manufacturers, repeated orders for this product have grown steadily. In terms of ICP equipment, the company will produce a total of 134 cavities of delivery equipment in 2021, with a year-on-year increase of 235%. Among them, Primo Nanonova has completed more than 100 process verifications and has delivered more than 180 reaction chambers. In addition, Primo Twin-Star, Primo TSV200E, Primo TSV300E equipment continued to receive repeated orders and expanded the scope of market validation. The company promotes the technology research and development of next-generation ICP etching products in an orderly manner to meet the ICP etching requirements of products such as logic chips below 5nm, DRAMs of 1X nm, and 3D NAND above 128 layers , and conducts high-yield ICP Development of etching equipment.
Mini LED MOCVD has won orders for over 180 cavities, and actively deploys Micro LED and third-generation half-power markets. In June 2021, the company officially released the MOCVD equipment Prismo UniMax for high-performance Mini LED mass production, and has received batch orders for a total of more than 180 cavities. At the same time, the company is developing special MOCVD equipment for Micro LED applications, and is actively deploying the third-generation semiconductor equipment market for applications, and developing MOCVD equipment for mass production of GaN power devices, which has been delivered to leading domestic and foreign customers for production. verify.
The research and development of CVD and EPI is progressing steadily, and it is planned to develop and deploy ALD and ALE equipment. The company's CVD tungsten process equipment used in metal interconnection has been able to meet the needs of customers for process verification, and is in the process of docking with key customers for verification; the research and development of LPCVD and EPI equipment is progressing well, and the EPI equipment has entered the prototype design, manufacturing and debugging stages to meet the needs of The electrical and reliability requirements of the SiGe epitaxial growth process in the customer's advanced process. At the same time, based on CVD equipment, the company plans to develop ALD and ALE equipment to realize the filling and etching of higher aspect ratio and smaller critical dimension structures to meet the needs of high-end logic devices and advanced memory chips.
Event: On March 29, the company released its 2021 annual report, with revenue of 3.108 billion yuan, a year-on-year increase of 36.7%; net profit attributable to the parent of 1.011 billion yuan, a year-on-year increase of 105.5%; The profit was 324 million yuan, a year-on-year increase of 1291%; the new signing in 2021 was 4.13 billion yuan, an increase of about 1.96 billion yuan compared with 2020, an increase of about 90.5% year-on-year.
The revenue of etching equipment increased by more than 50%, and the gross profit margin of MOCVD increased significantly. Benefiting from the development of the equipment market and the competitive advantages of the company's products, the revenue of etching equipment in 2021 will be 2.004 billion yuan, a year-on-year increase of about 55.4%, and the gross profit margin will reach 44.32%. MOCVD revenue was 503 million yuan, an increase of 1.5% year-on-year, mainly due to downstream market reasons and the newly signed Mini LED MOCVD orders this year have not contributed to revenue, but the gross profit margin reached 33.77%, compared with 18.65% in 2020. Greatly improved.
Etching orders have grown steadily, the market share of CCP equipment has continued to increase, and ICP process research and development has moved towards advanced processes. In 2021, the company will produce and ship 298 cavities of CCP etching equipment, with the output increasing by 40% year-on-year, and the market share of some customers has entered the top three. The equipment is widely used in 64-layer and 128-layer 3D NAND production lines. With the rapid increase in the production capacity of 3D NAND chip manufacturers, repeated orders for this product have grown steadily. In terms of ICP equipment, the company will produce a total of 134 cavities of delivery equipment in 2021, with a year-on-year increase of 235%. Among them, Primo Nanonova has completed more than 100 process verifications and has delivered more than 180 reaction chambers. In addition, Primo Twin-Star, Primo TSV200E, Primo TSV300E equipment continued to receive repeated orders and expanded the scope of market validation. The company promotes the technology research and development of next-generation ICP etching products in an orderly manner to meet the ICP etching requirements of products such as logic chips below 5nm, DRAMs of 1X nm, and 3D NAND above 128 layers , and conducts high-yield ICP Development of etching equipment.
Mini LED MOCVD has won orders for over 180 cavities, and actively deploys Micro LED and third-generation half-power markets. In June 2021, the company officially released the MOCVD equipment Prismo UniMax for high-performance Mini LED mass production, and has received batch orders for a total of more than 180 cavities. At the same time, the company is developing special MOCVD equipment for Micro LED applications, and is actively deploying the third-generation semiconductor equipment market for applications, and developing MOCVD equipment for mass production of GaN power devices, which has been delivered to leading domestic and foreign customers for production. verify.
The research and development of CVD and EPI is progressing steadily, and it is planned to develop and deploy ALD and ALE equipment. The company's CVD tungsten process equipment used in metal interconnection has been able to meet the needs of customers for process verification, and is in the process of docking with key customers for verification; the research and development of LPCVD and EPI equipment is progressing well, and the EPI equipment has entered the prototype design, manufacturing and debugging stages to meet the needs of The electrical and reliability requirements of the SiGe epitaxial growth process in the customer's advanced process. At the same time, based on CVD equipment, the company plans to develop ALD and ALE equipment to realize the filling and etching of higher aspect ratio and smaller critical dimension structures to meet the needs of high-end logic devices and advanced memory chips.