From a glean of the publications and literature available on the web, China is no stranger to synchrotron technology, having already built or is in the process of building à few synchrotrons ranging from first generation to 4th generation. The present 4th generation synchrotron facility (HEPS) currently in construction in Beijing has a circumference if 1.3 km while the 1st generation synchrotron that was built in 1991 has a circumference of 240 m. These are traditional synchrotrons.
The synchrotron for SSMB EUV lithography proposed by Tsinghua university presented in one of XJ Deng's papers is of a compact design with circumference of 100 to 150m and therefore is not very big . For SSMB EUV, the synchrotron need to be built or configured to operate in "low alpha" mode, which has to do with the arrangement of the magnet arrays (lattices) within the synchrotron.
By the way, the proof of principle work for SSMB was first done by the Tsinghua team at the MLS facility in Berlin because at that time, the MLS was the only synchrotron facility operating in the low alpha mode , not because China does not have the technology as someone was previously asking here
The synchrotron for SSMB EUV lithography proposed by Tsinghua university presented in one of XJ Deng's papers is of a compact design with circumference of 100 to 150m and therefore is not very big . For SSMB EUV, the synchrotron need to be built or configured to operate in "low alpha" mode, which has to do with the arrangement of the magnet arrays (lattices) within the synchrotron.
By the way, the proof of principle work for SSMB was first done by the Tsinghua team at the MLS facility in Berlin because at that time, the MLS was the only synchrotron facility operating in the low alpha mode , not because China does not have the technology as someone was previously asking here
