Chinese semiconductor industry

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tokenanalyst

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The Integrated Circuit Pilot Process R&D Center of the Institute of Microelectronics, Chinese Academy of Sciences is established under the support of the National 02 Science and Technology Major Project, designed and constructed according to the R&D needs of the industry, managed by the industrial technology R&D model, and operated by an international R&D team. R & D Center. The R&D center is committed to the research of CMOS pilot technology and other related technologies of silicon-based integrated circuits. It is the backbone of the research field of integrated circuit pilot technology in my country.

The R&D center currently has 150 R&D personnel, including 5 special experts of the National Thousand Talents Program, 1 specially-appointed expert of the Thousand Talents Program of Foreign Experts and 3 specially-appointed experts of the Hundred Talents Program of the Chinese Academy of Sciences. Its core team comes from world-renowned integrated circuit R&D institutions with more than 10 years of experience in R&D and scientific research management. Its engineering team has more than 5 years of industrial R&D or production experience, and there are more than 40 doctoral and master students.
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The R&D center has a complete 8-inch CMOS pilot line, optical lithography 130nm CD, electron beam lithography 20nm, in ALD (HfO2, Al2O3, TiN, TaN, W), Ge and III-V epitaxy, TSV, It has strong process capabilities on modules such as multi-target PVD sputtering and ultra-low energy ion implantation. There is also a 4-inch MEMS R&D line. In addition to undertaking the CMOS advanced technology research and development projects in the National Science and Technology Major Project, the center can provide technology research and development services for large enterprises, product development services for small and medium-sized enterprises, basic research and development services for scientific research units and universities, and engineer training services for enterprises.

center positioning

  1. Integrated circuit technology research and development platform


1. Research on CMOS leading process technology following Moore's Law;

2. Research on silicon-based devices and integration technologies beyond Moore's Law

  2. Validation and process development platform for domestic equipment and materials

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GodRektsNoobs

Junior Member
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Regarding the potential use of SSMB EUV, currently the European XFEL requires 9.5MW of power just to generate a 900W X-ray beam. And that's currently the most advanced technology in existence. Would this be economically competitive with LPP or DPP EUV, or does the power consumption need to decrease dramatically for it to be viable?
 

Hyper

Junior Member
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Regarding the potential use of SSMB EUV, currently the European XFEL requires 9.5MW of power just to generate a 900W X-ray beam. And that's currently the most advanced technology in existence. Would this be economically competitive with LPP or DPP EUV, or does the power consumption need to decrease dramatically for it to be viable?
I have been saying from the beginning that synchrotron are expensive, and impractical for mass production. They are scientific instruments for research not for semiconductor production. It is a white elephant.
 

gelgoog

Lieutenant General
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Well what made synchrotrons not useful was that the light source used to be really inefficient. Synchrotrons were used for x-ray lithography in like the 1980s but it never went past lab scale because of that. Supposedly the SSMB setup solves that problem and makes it cost effective for production purposes.
 

FairAndUnbiased

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I have been saying from the beginning that synchrotron are expensive, and impractical for mass production. They are scientific instruments for research not for semiconductor production. It is a white elephant.
Not really, synchrotron emission is highly collimated, anisotropic and tunable. I've posted on this before.

The entire cost of a synchrotron is $172 million USD which is slightly more than a single EUV instrument with the difference that you can spread the cost between multiple end stations while a single LPP source only powers 1 EUV instrument.

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FairAndUnbiased

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Well what made synchrotrons not useful was that the light source used to be really inefficient. Synchrotrons were used for x-ray lithography in like the 1980s but it never went past lab scale because of that. Supposedly the SSMB setup solves that problem and makes it cost effective for production purposes.
X-ray lithography has tons of problems utterly unrelated to efficiency. To be a good lithography source a wavelength of light must:

1. Interact with the resist strongly to create a chemical change in the photoresist at exactly the region of incidence

2. Create absolutely no chemical change where it is not incident on the photoresist

3. Be able to be transported and focused by optical devices

X-rays fail on all 3 because their absorption cross section with materials is very low (while EUV is very high and even air is opaque to it), the chemical change they do cause is core photo ionization which may not break bonds and if they do doesn't break selectively (EUV causes valence photo ionization and directly breaks molecules apart to affect chemical change), and X-rays cannot be focused effectively or transported with either reflection or refraction optics, only grazing incident optics. This severely limits its image forming capability.
 

Tyler

Captain
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Well what made synchrotrons not useful was that the light source used to be really inefficient. Synchrotrons were used for x-ray lithography in like the 1980s but it never went past lab scale because of that. Supposedly the SSMB setup solves that problem and makes it cost effective for production purposes.
What if the synchrotron is not cost effective? It does not matter, since they have the monetary resource, but the mass production time frame will be delayed.
 
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