This is another key piece of equipment and realized at 28nm. That's why even if EUV 5nm lithography comes out now other equipments haven't not reach that state.
Better way is to make EUV in sync with other equipments. EUV at 28nm.
Chinese semiconductor industry
- Thread starter Hendrik_2000
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Better way is to make EUV in sync with other equipments. EUV at 28nm.
@foofy @Temstar
Confirmation in english
from CnTechPost
A Chinese company has announced the successful production of an ion implantation machine made entirely with local technologies, marking a breakthrough in a key aspect of chip manufacturing, reported on March 17.
China Electronics Technology Group Corporation, which announced the breakthrough, said on Wednesday that its products include ion implanters for medium-beam, high-beam, high-energy, specialty applications, and third-generation semiconductors, covering process segments up to 28nm.
An ion implantation machine is a type of high-pressure mini-accelerator that is widely used in the chip manufacturing process.
It is used for ion implantation of semiconductor materials, large-scale integrated circuits, and devices by obtaining the required ions from an ion source and accelerating it to obtain an ion beam stream of several hundred kilo electron volts energy.
In addition, it can also be used for surface modification of metallic materials and film making.
Ion implantation machines are widely used in doping processes and can meet the requirements of the shallow junction, low temperature, and precise control, and are essential equipment in integrated circuit manufacturing processes.
Last June, China Electronics Technology Group announced the successful development of a million-volt high-energy ion implantation machine with independent intellectual property rights, breaking a decade-long blockade of the technology by other countries.
As essential core equipment in chip manufacturing, China's ion implantation machines rely heavily on foreign countries, especially the development of extremely difficult million-volt high-energy particle implantation machines.
At present, the most advanced international ion implantation machine is the PRHEI6Me produced by the German chip company Prima, which is the only 6-million-volt high-energy ion implantation machine in the world, and the only 6-million-volt high-energy ion implantation machine in the world that has been successfully commercialized.
Confirmation in english
from CnTechPost
China makes breakthrough in a key step in chip manufacturing
March 17, 2021A Chinese company has announced the successful production of an ion implantation machine made entirely with local technologies, marking a breakthrough in a key aspect of chip manufacturing, reported on March 17.
China Electronics Technology Group Corporation, which announced the breakthrough, said on Wednesday that its products include ion implanters for medium-beam, high-beam, high-energy, specialty applications, and third-generation semiconductors, covering process segments up to 28nm.
An ion implantation machine is a type of high-pressure mini-accelerator that is widely used in the chip manufacturing process.
It is used for ion implantation of semiconductor materials, large-scale integrated circuits, and devices by obtaining the required ions from an ion source and accelerating it to obtain an ion beam stream of several hundred kilo electron volts energy.
In addition, it can also be used for surface modification of metallic materials and film making.
Ion implantation machines are widely used in doping processes and can meet the requirements of the shallow junction, low temperature, and precise control, and are essential equipment in integrated circuit manufacturing processes.
Last June, China Electronics Technology Group announced the successful development of a million-volt high-energy ion implantation machine with independent intellectual property rights, breaking a decade-long blockade of the technology by other countries.
As essential core equipment in chip manufacturing, China's ion implantation machines rely heavily on foreign countries, especially the development of extremely difficult million-volt high-energy particle implantation machines.
At present, the most advanced international ion implantation machine is the PRHEI6Me produced by the German chip company Prima, which is the only 6-million-volt high-energy ion implantation machine in the world, and the only 6-million-volt high-energy ion implantation machine in the world that has been successfully commercialized.
I hope China doesn't fall in to the same trap we have. Americans lament the PRC's domestic surveillance while giving up every bit of privacy to private corporations happy to hand it over to the government so long as they get to exploit it for themselves too.
And Facebook has gotten rich by allowing political division, hate and conspiracy theories to flourish on its platforms.
Look at how Twitter allowed Trump to tweet for over a decade. And those lies took Trump to the White House.
Are you seriously saying a high stock market valuation for an unregulated Facebook/Twitter is worth the divisions they have caused to US society?
@WTAN as you mentioned before maybe CETC may have a 28nm or 22nm DUVL project in conjunction with SMEE?
@Wangxi So another SMIC FAB that will use the SMEE 28 DUVL? Since its a joint venture with Shenzhen local gov't surely it will use domestic equipment?
The Shenzhen project will "focus on the production of 28 nanometer and above integrated circuits and technical services with a goal of achieving eventual production capacity of about 40,000 12-inch wafers per month," the filing said, adding that production was expected to commence in 2022.
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