Hi WTAN,High Energy Ion implanter developed by CETC. More local Semiconductor Equipment on the way.
Need you to explain in a layman term the significant of this breakthrough? and also what other local Semiconductor Equipment?
Hi WTAN,High Energy Ion implanter developed by CETC. More local Semiconductor Equipment on the way.
Talk about the Trump administration failing in every single way in stopping China's rise, they only made it quicker and given they amount of hate sent China's way, it has only helped to ensure that anymore separatist activity is going to be far harder to do. Now all that needs to happen is the Trump administration to declare martial law on his own population and for the people there to rise up to help give China the time to perfect there new technology and it will be gg to those crazy bastards. I wonder, how many processes are required to talk there chip capability to 7nm and then to 5nm.High Energy Ion implanter developed by CETC. More local Semiconductor Equipment on the way.
Quite significant. An important step in the semiconductor manufacturing process has now been fully indigenized.High Energy Ion implanter developed by CETC. More local Semiconductor Equipment on the way.
So the current SMIC 14nm process uses some tech from the USA and it can't help with the production of chips for phones? I remember that some phones were made with SMIC help for Huawei, is it still possible?This latest sanction is a desparate last ditch effort by the Trump Administration to try to stop Huawei's Business. They probably heard about Huawei's plans to set up FABs to manufacture 40nm, 28nm and eventually 14nm and so forth. Unfortunately they will not suceed in stopping Huawei, just slowing it down a little while Huawei makes efforts in starting its own Chip production FAB with the SMEE 22/28nm Litho machine.
Huawei will be setting up a FAB with Local equipment to produce 28nm Chips next year. This will be sufficient to make FPGAs and SOCs for its 5G Base Stations. I can bet you that 14nm Chips will be produced by Huawei shortly after for its Mobile Phones. The 14nm Chip Tech is mature and is already being produced by a number of FABs in China and Huawei will eventually get its hands on this 14nm Finfet design. After that Huawei will look at 7nm Chips.
SMIC is currently already setting up a FAB in Beijing to produce 28nm Chips using all local equipment. News is that the new SMEE 22/28nm Litho Machine will be used in this FAB.
Apart from the new SMEE 28nm Litho Machine, quite a large number of 14nm to 28nm Semiconductor Equipments will be released by Local Companies by next year. This will allow fully localised Chip production lines to appear by next year.
Overall this latest action by the Trump Admin may delay Huawei by 6-12 months but it will ensure that more FABS with Localised equipment will be built.
Can you explain how ASML actually shut down the machine. As a company i have the power to ban ASML employee on site.
Output. The problem is output. For effective photoetching what matters is the total quantity of photons. A smaller wavelength means a higher energy photon. For the same amount of energy input you will get fewer shorter wavelength photons than longer wavelength photons. X-ray light sources certainly exist, but the ones that exist just don’t generate enough photons to make an effective scanner (putting aside how the high energy photons from X-rays cause secondary interactions in your etch process that would pose their own problems). It’s not like generating EUV light was a challenge in principle either. What made it difficult was finding a way to do it that would generate sufficient photon count output for a production quality scanner.
Output. The problem is output. For effective photoetching what matters is the total quantity of photons. A smaller wavelength means a higher energy photon. For the same amount of energy input you will get fewer shorter wavelength photons than longer wavelength photons. X-ray light sources certainly exist, but the ones that exist just don’t generate enough photons to make an effective scanner (putting aside how the high energy photons from X-rays cause secondary interactions in your etch process that would pose their own problems). It’s not like generating EUV light was a challenge in principle either. What made it difficult was finding a way to do it that would generate sufficient photon count output for a production quality scanner.
So the current SMIC 14nm process uses some tech from the USA and it can't help with the production of chips for phones? I remember that some phones were made with SMIC help for Huawei, is it still possible?
SMIC already stated that they will comply with US rules regarding the entities list. SMIC may produce chips using domestic machines, but they still use US software to design chips.Most definitely it uses tech from the US. Chip for phones is less of a priority for Huawei than chips for base stations which don't need 7nm. If China can build a fab that makes 28nm node with domestic equipment that will go a long way to solve the most urgent problems.
Quite significant. An important step in the semiconductor manufacturing process has now been fully indigenized.
SMIC already stated that they will comply with US rules regarding the entities list. SMIC may produce chips using domestic machines, but they still use US software to design chips.