December 1, 2024
A Chance for a Russian Lithographer
It seems that the only way for us is to repeat what ASML did. I beg to differ.
Based on long-term interaction with ASML and Zeiss on the development of the EUV lithograph, as well as my own experience in creating an experimental lithograph sample, the author is convinced that an attempt to copy the ASML lithograph will not lead to success.
Successful implementation of this concept, based on 2020s rather than 2000s technologies, will achieve the goals of making X-ray lithography more accessible to users without sacrificing resolution.
The latest achievements of the IPM RAS have allowed us to take a fresh look at the development of X-ray lithography from the point of view of reducing costs while maintaining minimum technological standards at the ASML level at the cost of some reduction in its productivity.