Germany Carl Zeiss, heart of Dutch ASML Lithography Equipment.

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WTAN

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Skywatcher said:
ASML might still have some room to breathe if they can sell EUV machines (there'll still be some demand in the next decade, since ASML machines currently have 3x more productivity compared to the Changchun prototype). TSMC would probably take advantage of presumably cheaper Chinese lithographic machines once the productivity rate goes up.

The real hurt will be with Cymer. If Harbin Institute of Technology gets their DPP to 300W power levels, then Cymer's LPP is finished (as of 2010, DPPs generally had lower power levels that LPPs, but enjoyed lower power consumption per photon levels, and had smaller logistical and maintainance footprints).
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I think ASMLs business in China will be finished. It will face competition in China from SMEE with its increasingly advanced DUV machines (SMEE 22nm vs ASML 38nm) It will also not be able to sell EUV in China as the US Government says it can't.

I believe Changchun Institute chose the DPP for a reason, other than efficiency & long term benefit. Their EUV machine using a DPP Light Source will enable it to sidestep and avoid alot of ASML Patents. It will also develop a different product to US based Cymer and avoid accusations of copying by Americans. This will allow potential global export of its EUV machines once the Patent issue is not a factor.
Yes.....they have to work to increase the productivity and increase power levels of the DPP.
 
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tidalwave

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WTAN said:
I think ASMLs business in China will be finished. It will face competition in China from SMEE with its increasingly advanced DUV machines (SMEE 22nm vs ASML 38nm) It will also not be able to sell EUV in China as the US Government says it can't.

I believe Changchun Institute chose the DPP for a reason, other than efficiency & long term benefit. Their EUV machine using a DPP Light Source will enable it to sidestep and avoid alot of ASML Patents. It will also develop a different product to US based Cymer and avoid accusations of copying by Americans. This will allow potential global export of its EUV machines once the Patent issue is not a factor.
Yes.....they have to work to increase the productivity and increase power levels of the DPP.
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In general LPP is more efficient in terms of energy conversion.
Right now. they are choosing DPP because its simplier to implement without that huge laser system.

They could still go back to LPP later . Huazhong university is one doing droplet generator for LPP.
 
broadsword

broadsword

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tidalwave said:
In general LPP is more efficient in terms of energy conversion.
Right now. they are choosing DPP because its simplier to implement without that huge laser system.

They could still go back to LPP later . Huazhong university is one doing droplet generator for LPP.
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What's their progress now?
 
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tidalwave

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t2contra said:
What's their progress now?
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THE Laser system required for LPP is huge, could be coupled room sized as they daisy chained the CO2 amplifier laser to get the final output seeded by an initial solid state laser with pulse in ns range.
Total power by laser system could be in excess of 3KW.

This is a hard one. Because on the slide i have seen no chinese institute doing it.

DPP maybe Ok for the initial or first gen EUV but eventually they need to tackle this. LPP is needed for later gen.
 
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tidalwave

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Maybe China can pull this off. The best EUV efficiency is based on Synchrotron which even better than LPP. Stadium sized infrastructure used to particle physics study. nationalize the EUV fab under state control and hook up the fab with Synchotron. If they do that, they would have huge amount of EUV light to work with. Therefore much higher throughput than TSMC and Samsung

You cant do that in western companies because they are private and they have no access to Synchrontron.

I might propose this idea to the Chinese government
 
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