Chinese semiconductor thread II

[tokenanalyst]

The freeform Illumination development that is critical for more advanced nodes was mostly completed in 2022-2023






Most of the recent development now I have found is in the algorithmic side.

Fast micromirror selection and angle setting algorithm for freeform pupil in the illumination system for immersion lithography machines​

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Abstract​

As lithography resolution improves, the performance requirements for illumination pupils in immersion lithography machines have become increasingly stringent, particularly regarding energy balance and polarization properties. These characteristics are primarily achieved by adjusting the angular distribution of the micromirror array (MMA). For technology nodes below 40 nm, the impact of light polarization on imaging must be considered. This paper proposes a micro-mirror selection and angle setting algorithm to maintain key characteristics of the freeform pupil, ensuring energy balance in both unpolarized and polarized states. Energy balance in the unpolarized state is influenced by the eccentricity of light, while energy balance in the polarized state depends on both the eccentricity and polarization properties of light. To validate the accuracy of the algorithm, simulations were conducted using freeform pupil illumination optical models for both unpolarized and polarized states. The results demonstrated a significant improvement in energy balance, with a reduction to 0.08% in both states. For engineering applications, the computational speed of the algorithm was enhanced, reducing the calculation time from 600 to 0.1 s.

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[tphuang]

By the way, I cleaned up some of the posts on this thread. If you have a point to raise then raise it. Dont make claims about a pretty reputable site pumping stocks. That’s not good argument.

 

[LanceD23]

I Think modern Computational lithography requires programmable illuminators or at least make it easier.

View attachment 174722

The crux asml value to the machine is its software driven control with feedback and feed forward to correct the variation due to temperature, pressure, vibration, ..etc Driving the mechanical motor to adjust the lens to compensate for all those variations on a nm scale. Its an old DUV system, but that control they got is probably their crown jewel and most likely use that same core for EUV or whatever system they want to make.

Also all those expansive electrical power systems they made.

 

[tokenanalyst]

Driving the mechanical motor to adjust the lens to compensate for all those variations on a nm scale

My guess you referring to the piezoelectric actuators used to correct aberrations.
By old I was referring to the interchangeable diffractive optical elements the same was developed by SMEE in 2009, this was changed by a programmable micro array with the flexray with advent of source mask optimizations techniques like in 2010 allowing smaller resolutions.
Yes is a marvel of engineering but for EUV given that everything has be done in vacuum so the software and controls are more complex.

 

[swcc]

Apple iPhone 17e wireless conectivity chip N1 and cellular modem C1X developed in Israel.

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[snake070]

Building an independent and controllable integrated circuit industry system: Reflections and suggestions on the development of China's integrated circuit industry during the "15th Five−Year Plan" period

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6.1 发展目标

（1）按 WSTS 的统计标准，中国集成电路产业跻身集成电路产业强国前 3 名的行列。

（2）国民经济领域需求的芯片自给率提高到 80%，加强集成电路全产业生态链的建设，国内能够满足市场需求的、小于 1 美元的中低档产品逐步减少进口或停止进口（用于整机产品加工复出口产品除外）。

（3）夯实自主可控的 28 nm 全产业链体系；14 nm 生产链能够稳定生产；初步完成全国产化的 7 nm 生产线建设及试运行。

（4）建设最先进工艺能力的公共平台来研发验证最新器件结构、工艺（逻辑、存储、光电、异构集成等）、装备、零部件、材料、EDA 软件等。成熟的新结构器件迅速扩大产能。

（5）在基础研究领域，原始创新能更多地涌现，在新器件结构、新材料、新工艺研发和生产的某些领域引领世界发展潮流。

(3) Consolidate a self-controlled and fully independent 28 nm full-industry-chain system; achieve stable production on the 14 nm production chain; and initially complete the construction and trial operation of a fully domestically sourced 7 nm production line.

上海微电子装备（集团）股份有限公司28 nm 光刻机（ArF，Immersion）进入工艺测试阶段

SMEE's 28 nm lithography machine has entered the process testing phase.

 

[snake070]

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国望光学投影光刻机曝光光学系统研发及批量生产基地项目竣工投产

The R&D and mass production base project for the exposure optical systems of projection lithography machines of Beijing Guowang Optical Technology Co., Ltd. has been completed and put into operation.

建设内容与规模:项目主要光刻机曝光光学系统生产、研发及配套设施,项目建成后年产ArFi; ArF; KrF; i-line光刻机曝光光学系统20套。项目劳动定员700人,年生产300 天，每天1班，每班 8小时，年运行2400小时。

Construction Content and Scale: The project primarily involves the production, R&D, and supporting facilities for lithography machine exposure optical systems. Upon completion, the project will have an annual production capacity of 20 sets of exposure optical systems for ArFi, ArF, KrF, and i-line lithography machines. The project will employ 700 staff, operate 300 days per year, with 1 shift per day, each shift lasting 8 hours, for an annual total of 2,400 operating hours.

 

[snake070]

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湖北菲利华石英玻璃股份有限公司国家企业技术中心创新能力提升项目

利用现有厂房986平方米，在合成产线基础上新增熔制炉、共聚焦显微镜光拉曼仪、弱吸收检测仪、激光热膨胀仪等共10台套，用于技术中心创新能力提升建设，面向极紫外光刻机对石英玻璃材料的需求进行超低膨胀石英玻璃的研制，搭建具有国际一流、国内领先的低膨胀石英玻璃研发、测试及生产全方位一体化平台。

The Innovation Capability Enhancement Project of the National Enterprise Technology Center of Hubei Feilihua Quartz Glass Co., Ltd.

Utilizing an existing plant area of 986 square meters, the project will add a total of 10 sets of equipment, including a melting furnace, a confocal Raman microscope, a weak absorption detector, and a laser thermal dilatometer, on the basis of the existing synthetic quartz glass production line. These additions will be used to enhance the innovation capability of the technology center. In response to the demand for quartz glass materials for EUV lithography machines, the project will carry out the development of ultra-low expansion quartz glass, and establish a fully integrated platform for R&D, testing, and production of low-expansion quartz glass that is internationally first-class and domestically leading.

 

[PopularScience]

By the way, I cleaned up some of the posts on this thread. If you have a point to raise then raise it. Dont make claims about a pretty reputable site pumping stocks. That’s not good argument.

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The information posted on Jiwei.com has since been deleted.

Much of the information in it was wildly inaccurate, even claiming that immersion lithography was showcased at the Shanghai Semiconductor Exhibition in March.

I attended the March exhibition. Shanghai Microelectronics (SMEE) did have a lithography machine model, but it was a dry lithography machine. SMEE has consistently refused to comment on or actively promote its 28nm immersion lithography machine, and the information it releases remains the same old stuff.

The equipment models from AMIES also all use dry lithography, not immersion lithography.

 

[tokenanalyst]

Dry series have this plain look like the KrF machine shown in the background. why change it in I-Line, what make this I-Line scanner special that require its own design, why it needs such big housing. If they didn't planned show immersion wouldn't be better to show the ArF dry scanner, even if immersion are usually better paired with KrF scanners but it would just better than showing those two.

Why SMEE can just be a normal SME company. Why Naura has not taken over this company already.