Page does not load on my browser. Anyone else? Suspect a stealth retraction due to lack of strong sources to corroborate.
Last edited:
Page does not load on my browser. Anyone else? Suspect a stealth retraction due to lack of strong sources to corroborate.
Now it straight up is "该文章不存在"Page does not load on my browser. Anyone else? Suspect a stealth retraction due to lack of strong sources to corroborate.
终于可以说点什么了】#半导体##芯片##光刻机#
接近于ASML的1980Di 的国产版,“批量”进入“工艺验证阶段”。
不是SSA800-10哦
写一篇,等着吧。
Clearly this is happening and it’s already in use somewhere given the YTMC and CXMT news but the production and delivery number, wafers per hour and type number all seem to be incorrect上次传闻中有对有错,机型和数量都错了。而这次放出来的,是硬货,而且时机是川帝来访前,呵呵
This SSA800 will get better and better very fast by feedback loop from SMIC, etc, hopefully newer version SSA900 announce soon which is expected to be equivalent to the performance level of the ASML TWINSCAN NXT:2000i and 2050i series. Hopefully in 2027well, it's just needed for the most critical layer IIRC?
so basically, this can fully replace 1980i IIRC (although at lower process rate).
Where are you getting this? It's in fact likely that SMEE just concentrate on ramping Arf/Arfi scanner production because their WPH rate is likely lower than that of ASML machines. So, they would concentrate on delivering to top end labs.
if you read the article. It says the machine being used is already at 90-95% yield. Which is quite significant.
And that they are delivering 5-8 in Q2
I guess you can compensate with multiple machines? SSA800 is likely less economical than ASML machines to start off. But given the latter might not have maintenance, seems like worth the trade off.
The 28nm number is only indicative of the machine's ability to etch on a single exposure, all current wafers use multi-exposure techniques to gain a huge accuracy advantage, including EUV machines. If true this will be sufficient to produce every node that SMIC is now manufacturing.So 2026/2027 is the year when China managed to do complete 28nm process on commerical scale, on all its own?
Is that the right conclusion?
If so, that can be compared to 2013 when various companies in the west achieved said process node? I am sure two are not directly comparable but still...
Probably it was creating more noise than they wanted, the editor ordered to take down the article, The industry is in total secret mode.Page does not load on my browser. Anyone else? Suspect a stealth retraction due to lack of strong sources to corroborate.
Probably 7 or 8 nm, but I don't think it can do 5nmThe 28nm number is only indicative of the machine's ability to etch on a single exposure, all current wafers use multi-exposure techniques to gain a huge accuracy advantage, including EUV machines. If true this will be sufficient to produce every node that SMIC is now manufacturing.
28nm planar needs double exposure, the key number is overlay, for 28nm planar is about 8nm, for 14nm Finfet 3.5nm and for 10-7nm is like 2.5nm.The 28nm number is only indicative of the machine's ability to etch on a single exposure, all current wafers use multi-exposure techniques to gain a huge accuracy advantage, including EUV machines. If true this will be sufficient to produce every node that SMIC is now manufacturing.
its cleat that, authorities still don't want to disclose the information so article removed from the website. most likely article draw enough attention.More like article that try to manipulate the stock price.