Four-Level Stacked Si0.7Ge0.3 Channel Gate-All-Around Transistor Using Novel Channel Release and Passivation Technology
Abstract:
Four-level Si0.7Ge0.3 nanosheet (NS) gate-all-around field effect transistor (GAAFET) is successfully prepared using novel channel release and passivation technology. First, a novel S-TMAH solution, which adds surfactant to tetramethylammonium hydroxide (TMAH), is developed to improve the selectivity of Si to Si0.7Ge0.3 to 23.5:F1 and attains excellent morphology of Si0.7Ge0.3 NSs. Additionally, compared with conventional O3 only passivation, a O 3+ Al2 O3 passivation technology is also adopted to reduce D it by 49%. As a result, after adopting the above-mentioned new technologies, stacked Si0.7Ge0.3 NS GAAFET exhibits superior electrical properties with subthreshold swing (SS) of 71 mV/dec, DIBL of 14 mV/V, peak hole mobility of 221 cm −2 /V ⋅ s, and Ion / Ioff ratio of 4.7×106 . This proves that S-TMAH release process combined with O 3+ Al2 O3 passivation technology is a promising candidate for application to SiGe high mobility channel NS GAAFET.