Chinese semiconductor thread II

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Honglei Optics received an order for a glass substrate (TGV)(Through Glass Vias) direct writing lithography machine​


With its advanced lithography technology solutions and professional and efficient team, Honglei Optics has won the favor of important domestic customers in the glass substrate ( TGV ) industry and obtained a purchase order for direct writing lithography machines. The signing of this order marks that our company has taken the lead in entering the field of glass substrate lithography.

Glass substrates are superior to organic substrates in terms of thermal expansion coefficient, signal transmission loss, chemical stability, and wiring density. They are particularly suitable for applications in AI computing chip packaging, C PO optical modules, Mini -LEDs , and other fields. With the continuous optimization of TGV technology and process technology, they are expected to replace organic substrates and become the core substrate in the field of advanced semiconductor packaging.

This time, Honglai Optics has reached an important cooperation with a key manufacturer in the field of glass substrates, marking another important layout of our company in the field of semiconductor advanced packaging lithography.

Honglei Optics is committed to micro-nano direct write lithography solutions. As of now , the company has launched three micro-nano direct write lithography equipment to the market (models: HL P20, HL P6 - E1 , HL P3 -E1 ) , focusing on three application areas: PCB HDI&FPC circuit boards, semiconductor glass substrates, and advanced packaging mask plates, and has obtained orders from leading customers.

The product series planned and developed by the company covers micro-nano direct-write lithography equipment with optical resolution ranging from 20μm to 0.5μm, which can meet the direct-write lithography needs in multiple fields such as PCB HDI&FPC, IC packaging substrates, semiconductor masks, glass substrates and advanced packaging.

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Guangzhou Yuesheng completes R&D and ships 8-inch SiC epitaxial equipment​


Guangzhou Yuesheng Semiconductor Equipment Co., Ltd. announced the successful completion and delivery of its independently developed 8- inch silicon carbide ( SiC ) epitaxial growth equipment to a leading customer. This achievement not only marks a significant milestone in the company's technological development, but also signifies the Chinese SiC industry's achievement of independent control in key equipment, injecting strong momentum into the industry's high-quality development.​

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Longtu Optical Announces Mass Production of 90nm Node Mask​

According to Longtu Photomask's official Weibo account, Longtu Photomask, a domestic independent third-party semiconductor mask manufacturer, has successfully commenced production at its Zhuhai project, demonstrating significant progress in its third-generation mask PSM products. The company's KrF-PSM and ArF-PSM products have been shipped to select customers for testing and verification. The company's 90nm node products have successfully transitioned from R&D to mass production, and 65nm products have begun sampling for verification. This further strengthens the company's influence in high-end processes and expands its reach into a wider range of downstream markets.​

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tphuang

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曦智科技 (Xizhi Tech) displayed their photonic distributed OCS chip product at WAIC 2025 called LightSphere X. Connected with Biren Tech & ZTE in application. Installed in 上海仪电国产超节点算力集群AI cluster.

It has invested in photonic chips including oMAC, oNOC and oNET (so all networking it seems like)

Nvidia as also been exploring into this with iPronics
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more details on this deal for distributed OCS switching chips. It's done with Biren GPUs and ZTE server.

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allows 2000 GPUs to be connected in a super node. The thing with OCS is you don't need the complex wiring (IIRC), so you can have larger super nodes.
 
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