Chinese semiconductor thread II

tokenanalyst

Brigadier
Registered Member
i replied to this question.. just check my massage above. she basically know absolutely nothing about Lithography. and got completely out of touch with all latest development and progress done by Chinese institutes in past few years.

she literally said 10W light source for immersion scanner.. WTFFF
View attachment 147557

havok said in March 2023, 60W 6KH light source for ArFi validated.................
A reverse search give that is a "he", I thought that Leslie was a female name, looks he added Leslie to sound more Westerner. The guy is a Namura money guy who he says worked in fab construction. Basically his entire business model is to "leak" whatever Chinese information he can get to his Japanese clients for money. But if the information that he is selling is as bad as the things he post, good god he robbing those poor Japanese dudes. The fact the this dude correlate the ArF excimer laser used by SMEE in 2001 developed by CAS with whatever they are using today by RSLaser is outrageous. There is 20 year development gap, is not even the same Laser.
 

sunnymaxi

Major
Registered Member
A reverse search give that is a "he", I thought that Leslie was a female name, looks he added Leslie to sound more Westerner. The guy is a Namura money guy who he says worked in fab construction. Basically his entire business model is to "leak" whatever Chinese information he can get to his Japanese clients for money. But if the information that he is selling is as bad as the things he post, good god he robbing those poor Japanese dudes. The fact the this dude correlate the ArF excimer laser used by SMEE in 2001 developed by CAS with whatever they are using today by RSLaser is outrageous. There is 20 year development gap, is not even the same Laser.
damn. now i got it. :p

honestly we still have many boomers in our society. but this article is so so bad i can't even Remember, when last time i read this off the mark piece of shit. this is basically completely out of touch with the reality.. dude don't even know the RSLaser name. he confidentially wrote immersion scanner with 10W light source.. LMAO

he didn't give any authentic source, neither write any top institute name. also totally wrong with power output and confused with resolution the process node..

just for the information -

''On March 8, during the second "Representative Channel" interview activity of the Third Session of the 14th National People's Congress, HGTECH Ma Xinqiang: China's laser industry has entered the world's first echelon''
 

sunnymaxi

Major
Registered Member
I think the confusion comes on how SMEE named their first dry scanner, the SSA600/10, at the time the ArF laser was 20W so people assumed that the new one will be called SSA800/10.

Why not SSA700?

View attachment 147561
RSLaser 60W 6KH immersion light source verified back in 2022.. they were working on more powerful light source like 90W. its already been 3 years. so development must be in advance stages or near completion.
 

latenlazy

Brigadier
This is a picture of the same interferometer for EUV optics that circulates since some days. This is not an EUV machine.

Incredible how wildly rumors snowball on the net!
Something worth considering is that usually these kinds of auxiliary support tools don’t get made until the instrument they’re meant to support has its design finalized with very high confidence, and their verification process typically will involve testing on multiple samples of the equipment it’s meant to support just to confirm generalizable performance. All this is to say that the existence of this optics calibration tool *strongly* indicates that whichever equipment it’s meant to support is at a very mature phase of the R&D development process.
 

OptimusLion

Junior Member
Registered Member
The world's first independently developed C2W&W2W hybrid bonding equipment is unveiled! Qinghe Jingyuan breaks through the advanced packaging market and accelerates domestic substitution

On March 12, Qinghe Jingyuan officially released the world's first independently developed C2W&W2W dual-mode hybrid bonding equipment SAB 82CWW series, breaking the technology monopoly of international giants and marking that domestic high-end bonding equipment has entered the first echelon in the world. The equipment, through an integrated architecture design, realizes the dual-mode collaboration of C2W (chip-wafer) and W2W (wafer-wafer) for the first time, providing a new "flexible + efficient" solution for the semiconductor industry.



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