Chinese semiconductor thread II

sunnymaxi

sunnymaxi

Major
Registered Member
Weaasel said:
Still waiting until SMEE finally announces and then after that it is proven that it has built a DUVi machine equivalent at least to the mid range level of performance of those of ASML, Canon, and Nikon, using entirely domestically made equipment. When this happens, China will at least be free, because doing so will mean that China will also have solved its lapses in aligning and other necessary metrological equipment in chip making.
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Randomuser said:
When it finally happens it will be a massive moment in history for China. But I feel when it happens you won't feel the hype because few will cover it.

When the ws15 engines were ready for j20, for some reason there was not much impact as expected. Maybe it's China's strategy to keep everything under wraps even big breakthroughs. That way by the time you know China has it, it's too late. Better being like India and announcing every single thing for the world to hear.
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@Weaasel it seems you missed a lot information on this thread or you don't read previous pages of this thread ..

SMEE last year officially announced top Metrology tool ''SHM800'' for chip making.. it is said to be pair with SSA800i.. SMEE specifically mentioned 7nm .. so metrological equipment aligning with Litho have solved already..

5454545.jpg

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all core and critical components of SSA800i are locally developed and produced by Chinese companies/institutes.. like lens , optical system , light source .. we have complete information available on this thread..

Havok confirmed this news- all technical bottleneck regarding immersion machine have solved. back in 2022.. so there is no technological hurdle in immersion machine..

so now its all about verification time period and work for volume production. this thing always takes time..
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AECC didn't announce WS-10 engine completion news, never announced mass production. never disclose WS-10 engine specification. same happening with WS-20/WS-15 engines ..

SMIC didn't announce Finfet production.. still not acknowledge about 7nm .. though its been a year since Mate60 released.. LOL

this is how we Chinese people works..

so probably SMEE might never announce SSA800i.. though we have information from suppliers announcement about volume production .. this year SMEE is all set to start volume production of Lithography .. this is confirmed information..
 
P

paiemon

Junior Member
Registered Member
ansy1968 said:
Speaking of equipment sales, I read that ASML had been harvested by the American as it plan to moved its operations and manufacturing to the US.

So now we know Xi subtle reminder to Rutte is all about.
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Do you have a link for that regarding ASML moving its operations to the US? It already has a large US footprint with regards to subsystem and components manufacturing, so I don't think any US expansion would be impactful since their existing footprint already subjects them to extraterratorial actions. My understanding is ASML's CEO complained about being unable to achieve their goals due to lack of support from Dutch government, and there was no statement regarding moving to the US.
 
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ansy1968

Brigadier
Registered Member
sunnymaxi said:
@Weaasel it seems you missed a lot information on this thread or you don't read previous pages of this thread ..

SMEE last year officially announced top Metrology tool ''SHM800'' for chip making.. it is said to be pair with SSA800i.. SMEE specifically mentioned 7nm .. so metrological equipment aligning with Litho have solved already..

View attachment 127583

---------------------------------------------------------------------------------------------------------

all core and critical components of SSA800i are locally developed and produced by Chinese companies/institutes.. like lens , optical system , light source .. we have complete information available on this thread..

Havok confirmed this news- all technical bottleneck regarding immersion machine have solved. back in 2022.. so there is no technological hurdle in immersion machine..

so now its all about verification time period and work for volume production. this thing always takes time..
----------------------------------------------------------------------------------------------------------
AECC didn't announce WS-10 engine completion news, never announced mass production. never disclose WS-10 engine specification. same happening with WS-20/WS-15 engines ..

SMIC didn't announce Finfet production.. still not acknowledge about 7nm .. though its been a year since Mate60 released.. LOL

this is how we Chinese people works..

so probably SMEE might never announce SSA800i.. though we have information from suppliers announcement about volume production .. this year SMEE is all set to start volume production of Lithography .. this is confirmed information..
Click to expand...
A better guide is PLA watching, they will officially announce a new machine when it entered service.
 
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ansy1968

Brigadier
Registered Member
From this ASML may have seen the writing on the wall and may agree, they will be looking for the US for subsidy money cause they know that further restriction is useless and their China market is done as they know that SMEE SSA800 is being mass produce.
 
S

staplez

New Member
Registered Member
sunnymaxi said:
@Weaasel it seems you missed a lot information on this thread or you don't read previous pages of this thread ..

SMEE last year officially announced top Metrology tool ''SHM800'' for chip making.. it is said to be pair with SSA800i.. SMEE specifically mentioned 7nm .. so metrological equipment aligning with Litho have solved already..

View attachment 127583

---------------------------------------------------------------------------------------------------------

all core and critical components of SSA800i are locally developed and produced by Chinese companies/institutes.. like lens , optical system , light source .. we have complete information available on this thread..

Havok confirmed this news- all technical bottleneck regarding immersion machine have solved. back in 2022.. so there is no technological hurdle in immersion machine..

so now its all about verification time period and work for volume production. this thing always takes time..
----------------------------------------------------------------------------------------------------------
AECC didn't announce WS-10 engine completion news, never announced mass production. never disclose WS-10 engine specification. same happening with WS-20/WS-15 engines ..

SMIC didn't announce Finfet production.. still not acknowledge about 7nm .. though its been a year since Mate60 released.. LOL

this is how we Chinese people works..

so probably SMEE might never announce SSA800i.. though we have information from suppliers announcement about volume production .. this year SMEE is all set to start volume production of Lithography .. this is confirmed information..
Click to expand...
I'm sure you meant this is how the Chinese work under foreign oppression. But I want to make clear, this is not how Chinese people usually work. Generally, China has been open and transparent about their scientific advancements. Often willing to share secrets and work with others to better scientific understanding. Just look at China's space station and satellites. China has invited everyone to work with them on it.

But if you try to suppress China, well then they go into secret mode. This is clearly then not China's choice but what they have to do in order to keep their sovereignty.
 
T

tokenanalyst

Brigadier
Registered Member

Investigation of the Ion Thermal Effect on Tin Contamination in Low-Temperature Hydrogen Plasma Cleaning.​


Chinese Academy of Sciences (CAS) - Lanzhou Institute of Chemical Physics
Sichuan University

Abstract

The tin contamination is one of the crucial issues faced by Sn-based Extreme Ultraviolet (EUV) light sources and the ITER fusion program. Based on the synergistic effect of hydrogen atoms and ions on tin atoms (generating SnH4), the tin contaminations would be expected to achieve efficient and non-destructive cleaning on the multilayer mirror (MLM) or first mirror (FM) surface by its self-discharge hydrogen plasma cleaning. A comprehensive evaluation of the surface ion energy distribution of MLM was conducted at 1 W, considering the influence of plasma sheath on ion energy. The ion energy distribution at the electrode surface is 23-40 eV and mainly concentrates at 32 eV. The calculation results indicate that the thermal effect of ions on tin (about 307.2 kJ/mol) is higher than the melting enthalpy of tin (7.08 kJ/mol), which could be caused by the local melting of tin particles, as evidenced by the apparent changes in morphology observed after plasma cleaning at 1 W. The comparative experiments of hydrogen atom cleaning, annealing, and re-deposition confirm that the ion-induced thermal effect is the leading cause of tin particle deformation.

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