At this exhibition, Dongfang Jingyuan brought a new generation of electron beam measurement and inspection equipment, including defect re-inspection equipment DR-SEM, measurement equipment CD-SEM, defect inspection equipment EBI, and a product that integrates yield data, defects YieldBook is a yield management system that integrates data and measurement data collection and analysis.
Dongfangjingyuan DR-SEM has entered the head client verification, and the verification results of technical indicators such as image quality, algorithm (D2D) and CR (>95%) meet the mass production requirements. It is worth mentioning that the self-developed optical window OM imaging system not only reduces foreign supply chain risks, but also has been unanimously recognized by customers for its verification of the Auto Bare wafer review function, which can meet the re-inspection requirements for 70nm defects. At the same time, combined with the upcoming new generation of self-developed EOS and DUV inspection systems, it is expected to meet the needs of advanced manufacturing processes for unpattern wafer defect re-inspection.
The new generation 12-inch CD-SEM model SEpA-c430 has achieved comprehensive improvements in measurement performance and speed. The measurement repeatability reaches 0.25nm, meeting the needs of 28nm production lines. At the same time, through improved electron beam scanning and signal detection, production capacity has been increased by 30%. The newly launched wafer surface charge compensation function can improve ADI layer measurement capabilities. In addition, the SEpA-c310 launched for the third-generation semiconductor market not only achieves 6/8-inch compatibility, but also achieves compatibility with different materials and thicknesses (such as GaN/SIC), which has been implemented by multiple head customers. It has passed mass production verification and entered the mass production line.
Dongfang Jingyuan’s 12-inch EBI continues to iterate and improve detection capabilities. The new generation SEpA-i525 model adopts continuous scanning mode, enriches the Negative mode detection method, increases the maximum beam current to 40nA, adds functions such as Flooding Gun, and has a higher production capacity than the previous generation. The model has been increased by more than 3 times, the application field has been expanded from logic Fab to memory Fab, and the new product has entered the Fab verification of many domestic leading customers.
Computational lithography platform PanGen adds new products
PanGen Yield Comprehensive Optimization System is a computational lithography software product of Dongfang Jingyuan. This product has OPC optimization functions suitable for mature process nodes. It is also the first full-chip inverse lithography (ILT) with a CPU+GPU hybrid architecture. ) function of the mask optimization tool. Reverse lithography has proven to be an effective mask optimization technique for projecting lithography-limited process nodes.