Sirui Intelligent completed hundreds of millions of yuan in Series B financing, focusing on the semiconductor front-end process equipment track
Qingdao Sifang Sirui Intelligent Technology Co., Ltd. (referred to as Sirui Intelligence) recently completed hundreds of millions of yuan in Series B financing. This round of financing was jointly led by SAIC Strategic Direct Investment, Shangqi Capital and CDH Investment; well-known investors such as China Merchants Venture Capital, Shanghai Gimpo, Xinding Capital, Sinovation Ventures, Huakong Fund and Qing Venture Capital also participated in the investment; Old shareholders such as Ocean Pine Capital, Haiao Xinke, Xinxin Venture Capital, Hengchuang Investment, and Tongge Venture Capital continue to support the company.
Qingdao Sifang Sirui Intelligent Technology Co., Ltd. was established in 2018 and is headquartered in Qingdao, China, with R&D centers in Beijing and Shanghai. Sirui Intelligent mainly focuses on key semiconductor front-end process equipment. Its products include atomic layer deposition (ALD) equipment and ion implantation (IMP) equipment, which can be widely used in integrated circuits, third-generation semiconductors, new energy, optics, parts coating, etc. Many high-precision fields.
Official news from Sirui Intelligent shows that in 2018, the company completed the acquisition of 100% equity of Beneq in Finland, the birthplace of ALD technology. Sirui Intelligent integrates Beneq's overseas cutting-edge technology research and development resources, carries out domestic and foreign joint research and development and domestic industrialization of ALD technology, and has established a complete ALD product system, covering many leading customers around the world and gaining market leadership in many market segments. competitive position. After promoting the transformation and upgrading of the ALD business, it laid out the ion implantation equipment business and achieved breakthroughs. SIRUI Intelligence uses high-energy ion implanters as the entry point to carry out research and development, solve the problem of "stuck neck" of domestic high-end ion implanters, and gradually complete the layout of a full range of models in the silicon-based and compound semiconductor fields.