Recently, Gaoche Technology Co., Ltd. signed a new order for its 8-inch semiconductor diamond wire slicer. After the equipment is delivered, it will be shipped to a European semiconductor company. This is the first overseas customer for the company's semiconductor equipment.
The customer of this cooperation is the largest local monocrystalline silicon plate manufacturer and one of the leading manufacturers of ultraviolet medical equipment and LED equipment. Gaoche will provide it with an 8-inch semiconductor diamond wire slicer with leading performance and stable quality parameters
. , small loss of silicon material, high cutting efficiency, low other advantages, helping customers reduce costs and increase efficiency.
As early as 2018, Gaoche Co., Ltd. began to lay out the technology exploration and research and development of semiconductor equipment, and officially introduced diamond wire cutting into the field of semiconductor silicon materials. At present, the company's products developed for the semiconductor industry mainly include:
semiconductor single wire cutting machines, semiconductor diamond wire slicing machines, semiconductor grinding machines, semiconductor special diamond wires and chamfering grinding wheels, spheronizing grinding wheels and thinning grinding wheels. By providing the industry with full-category solutions of "cutting equipment, cutting consumables, and cutting processes", we promote the development and innovation of the semiconductor industry. Up to now, the company has formed a sustained and stable cooperation with leading customers in the industry. Both semiconductor slicing machines and cutting machines have been sold in batches, basically covering the demand for new semiconductor diamond wire slicing production capacity.
Next, Gaoche will continue to leverage its professional and technical advantages in the field of cutting highly hard and brittle materials to provide the industry with more reliable and advanced semiconductor cutting solutions, help customers reduce costs and increase efficiency, and promote the localization of semiconductor equipment.