I am getting tired of journalist and "analysts" talking garbage, that 7nm thing apart from being a marketing scheme, doesn't come from the lithography machine alone but from the fab process using multiple patterning techniques. My guess is most analysts think that if you have an ASML machine, BAM, you can make 7nm chips without any effort. Even with EUV, yes the chip may need less patterning but everything else is more complicated and expensive compared to immersion lithography, from the photo-resist to the mask. I don't think is you have an EUV machine and magically the fab is making 3nm chips.This scmp article is just a detractor.
At the end the resolution of ASML Arfi machines are 38nm and the most recent EUV machine is 14nm. 38nm sounds a lot closer to 90nm than 7nm doesn't? But they don't tell you that doesn't? In fact i convinced that with good overlay that 90nm can do much lower resolution features without the need of an immersion system.