I really don't know. But the posts make it seem like if they are building the machine from the ground up.@tokenanalyst bro the basis of SMEE SSA800 28NM DUVL came from SMEE 90nm by adding immersion?
I really don't know. But the posts make it seem like if they are building the machine from the ground up.@tokenanalyst bro the basis of SMEE SSA800 28NM DUVL came from SMEE 90nm by adding immersion?
I think another thing to note here, correct me if I'm wrong as I'm not an expert90 nm isn't bad at all. It is literally at the same level as Canon, a historical giant in optical technology. SMEE has achieved commercial success in packaging lithography applications (40% market share). They laugh but they don't realize that it already has commercial success and "good" vs "bad" is a far smaller gap than "having" vs "not having".
Even as a front end technology, 90 nm is plenty for even some pretty high end microcontrollers that can do everything except run high fidelity graphics and real time DSP. For instance, programming an embedded chip like ARM or AVR, you realize that you can do quite a bit (as in, build some types of scientific instrumentation and machine tools) with 32 bit microcontrollers on a 180 nm process. The cost of scientific instruments and machine tools is rarely the chips, it's the extremely high quality materials and specialty parts.
I think another thing to note here, correct me if I'm wrong as I'm not an expert
The jump from 90nm down to 45nm is/was prime Moore's Law territory, so it would only take 2-5 years (historically speaking)
I also believe there are no native Japanese processes running smaller than 45nm anyway, so in theory SMEE is in position to cash in on chips for most industrial chips (which is the bread and butter of Japanese production)
I really don't know. But the posts make it seem like if they are building the machine from the ground up.
SMEE has a 65nm Dry DUVL which was available a few years ago.@tokenanalyst bro the basis of SMEE SSA800 28NM DUVL came from SMEE 90nm by adding immersion?
@WTAN Sir any news on the rumored 22nm DUVL being develop by SMEE?SMEE has a 65nm Dry DUVL which was available a few years ago.
@WTAN Sir the foundation of SSA800 DUVL by adding immersion?SMEE has a 65nm Dry DUVL which was available a few years ago.
I really don't know. But the posts make it seem like if they are building the machine from the ground up.
I believe it was a gradual development over time which led eventually to the 28nm DUVL.@WTAN Sir the foundation of SSA800 DUVL by adding immersion?
IN the YAHOO Article, the Dutch acknowledge that the ASML Monopoly on EUVL Machines will last up till 2025.To China? I believe that ASML and even the Dutch government wants to continue dominating the Chinese market, they want to continue selling at least their DUVi machines to China. The problem is that the United States has groups that want to restrict or even destroy the Chinese semiconductor industry because it is a strategic industry. ASML and to some extent Nikon are key to that goal. You can have all semiconductor manufacturing equipment and software, but if you can't print the patterns of your chips you can't make them. For now the goal of the American government is to set China at 14-10nm, but if Trump wins and the Republicans take power, the goal could become to destroy the entire Chinese semiconductor industry. And I say this without hyperbola, I believe China should make its semiconductor industry independent of the United States as much as possible. Americans normally bully countries that are highly dependent on foreign technology. If the Chinese achieve a certain level of technological independence, the Americans are going to back down because their companies are going to complain.
Why is that interesting, Sleepystudent?Interesting given that SMIC doesn't list a Chengdu foundry on their website
Its a stealth FAB design by CACThe ArF immersion scanner is supposedly being placed in a location where there is no foundry