Chinese semiconductor industry

From @Oldschool So from far back at 2016, Huawei had an eye for EV, the Wuhan FAB is the first of many new technology Huawei had invested in, will they try to enter the Battery sector? maybe IF they're able to find a solution to their Chip problem which is a priority.

Huawei Lidar Laser Radar production facility setup in Wuhan.
It's for EV automotive.



In order to start pre-research on lidar products in 2016, the team visited a large number of TOP car companies, listened to the demand for lidar products, and at the same time searched for manufacturers in the industry chain. After half a year of research, the direction was clear: to be a high-performance , Car-level, mass-produced lidar. Based on this positioning, Huawei has defined, designed and developed this 96-line medium and long-range lidar product...

Please, Log in or Register to view URLs content!

为激光雷达产品于 2016 年开始预研，该团队访问了大量的TOP车企，倾听对激光雷达产品的需求，同时遍寻产业链厂家，经过半年的调研明确了方向：要做一款高性能、车规级、能够大规模量产的激光雷达。基于此定位，华为定义、设计和开发了这款96线中长距激光雷达产品……

ansy1968 said:

@BlackWindMnt bro I think we need to ask @WTAN a technical question, Sir regarding this " Shanghai Microelectronics is developing an ArF immersion lithography machine, which can cover 45-22nm". Is this a new machine or an improvement on SMEE 28NM DUVL? 22nm with double patterning it can do 10nm Chips and multiple patterning a 5nm? and if does a comparable machine to the incoming Nikon DUVL and ASML NXT 2050i?

Click to expand...

I actually posted a article a long time ago (article probably no longer available) that claims that SMEE has already developed a 28nm Node DUVL and that they are now developing or may already have developed a 22nm Node DUVL. In other words a DUVL that can produce 22nm ICs with a single exposure.
This means a DUVL that can potentially produce 5nm ICs.
This would probably be equivalent to the Nikon DUVL that is slated to be released in 2023 and that can produce 5nm ICs.
It is good to know that SMEE is constantly doing R&D to improve its products as it knows that the Chinese Semiconductor Industry will have to rely on DUVL before the Chinese EUVL comes online.

The SMEE 28nm DUVL uses advanced and innovative Optics to save on production costs and increase resolution.

WTAN said:

The SMEE 28nm DUVL uses advanced and innovative Optics to save on production costs and increase resolution.

Click to expand...

@WTAN Sir thanks for the info in this regard the only way to improve the machine and be comparable to ASML NXT 2050i is to boost the light source?

ansy1968 said:

@WTAN Sir thanks for the info in this regard the only way to improve the machine and be comparable to ASML NXT 2050i is to boost the light source?

Click to expand...

Yes the Light Source will be improved to match that used on the 2050i and Nikon.
But generally they are working on improving the DUVL overall in order to be able to process the 5nm Node.

WTAN said:

Yes the Light Source will be improved to match that used on the 2050i and Nikon.
But generally they are working on improving the DUVL overall in order to be able to process the 5nm Node.

Click to expand...

Will the Nikon future (2023) DUV be equivalent to 2050i, honestly I doubt it

Is the 2050i the only DUV machine is not allowed to be exported to China by ASML ?

@WTAN Do you think EUVL could make its appearance earlier, say by end of 2023?

antiterror13 said:

Will the Nikon future (2023) DUV be equivalent to 2050i, honestly I doubt it

Is the 2050i the only DUV machine is not allowed to be exported to China by ASML ?

Click to expand...

The only DUVL allowed to be exported currently to China is the 1980i.
I think with the arrival of the SMEE 28nm DUVL, ASML will probably allow the export of the 2000i at a very cheap price. Dumping to gain market share.

The 2050i Is currently the ASML state of the art or latest machine. It has an advanced Light Source.

The future Nikon will certainly be much better than the 2050i as it is a next generation DUVL with very good overlay accuracy.
It is develop specifically to do the 5nm and 7nm Nodes.

t2contra said:

@WTAN Do you think EUVL could make its appearance earlier, say by end of 2023?

Click to expand...

I believe that China has decided principally to go with the LPP EUVL Light Source.

They are putting alot of resources into developing the MOPA C02 Lasers for the LPP Light Source and they are at an advanced stage of development.
I wouldnt be surprised if the prototype comes out in 2023 and be ready for use by 2025.

There are others who insist that the Development of the DPP EUVL is continuing with the support of Huawei and the Chinese Academy of Sciences.
This DPP EUVL could come out earlier than the LPP EUVL.

WTAN said:

I believe that China has decided principally to go with the LPP EUVL Light Source.

They are putting alot of resources into developing the MOPA C02 Lasers for the LPP Light Source and they are at an advanced stage of development.
I wouldnt be surprised if the prototype comes out in 2023 and be ready for use by 2025.

There are others who insist that the Development of the DPP EUVL is continuing with the support of Huawei and the Chinese Academy of Sciences.
This DPP EUVL could come out earlier than the LPP EUVL.

Click to expand...

So LPP light source is more advanced than DPP ? please educate us in a simple term, thanks