Further confirmation regarding the technical certification of the SMEE 28NM DUVL and had been delivered to downstream enterprises to produce 28nm chips by the end of this year. So
@gadgetcool5 @Annihilation98 and
@asta hope this answer your constant questioning of China IC progress, being critical is okay we need to be cautious But its tiring to keep repeating the same post over and over again.
1.6K views1 day ago
According to media reports,
the 28nm lithography machine developed by Shanghai Microelectronics has passed the technical certification and can be delivered to downstream enterprises to produce 28nm chips by the end of this year. The 28nm lithography machine developed by Shanghai Microelectronics
can be used to manufacture 14nm and more advanced chips through multiple exposure and other process technologies. With the news of the landing of domestic 28nm lithography machine, the Chinese Academy of Sciences developed a new 5nm laser lithography technology was once again turned out by the media hype: after the emergence of 5nm laser lithography technology, China's lithography machine will be expected to break through 5nm, in fact, the Chinese Academy of Sciences mastered this technology as early as July last year, after nearly a year of technical improvements, China took a step to break the monopoly of ASML's lithography machine The first step, the domestic lithography machine is expected to break through 5nm in a short period of time.