Oh, hell yeah, son! This is the kind of news I was waiting to see in this thread.Some news on Chinese development of LPP EUVL in Shanghai.
SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.
Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
@ZeEa5KPul Me too bro!!! so yeah 2025, same year as the operational of TSMC FAB 21 and Samsung Tyler FAB in Texas. So a generation (2023 due to TSMC 3NM delayed) behind if all goes well for SMIC 5nm chips.Oh, hell yeah, son! This is the kind of news I was waiting to see in this thread.
China needs to localize that Spiricon software used.Some news on Chinese development of LPP EUVL in Shanghai.
SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.
Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
Some news on Chinese development of LPP EUVL in Shanghai.
SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.
Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.
excuse me ! can you tell me when was this paper published ?Some news on Chinese development of LPP EUVL in Shanghai.
SMEE will officially begin development of EUVL using LPP Light Source next year.
There have been some changes to management in the parent company of SMEE (Shanghai Electric) which will see more funding for R&D going to SMEE.
Shanghai Institute of Optics have been making good progress in the development of the LPP EUV Light Source.
China has already developed a 10KW Pulsed MOPA CO2 Drive Laser for the Light Source in 2012/13.
Shanghai Inst is working on increasing the average power of the Drive Laser by adding more Laser Amplifiers.
Gigaphoton uses a 27KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
ASML uses a 30KW - 40KW Drive Laser to achieve a EUV Source Power(IF) of 250W.
Experts say that Shanghai Inst should have no problems in developing an equally powerful MOPA CO2 Laser.
China has a mature Laser manufacturing Industry supply chain.
China already produces 15KW to 20KW Fast Axial Flow CO2 Lasers which are used as Amplifiers in the MOPA Laser System.
The Shanghai Inst Research in Light Source is going along well.
Target is 2025 for LPP EUVL introduction.