Chinese semiconductor industry

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Skywatcher

Captain
to summarize

A) If SMEE new machine is:

28nm single exposure resolution --> This is an pretty amazing achievement and 7nm chips is definitely Possible

B) if it's

28nm after multiple exposure and is the smallest node practical. Then we are light years from 7nm.


Some sources say its A and some say it's B. I want to believe it's A, but there is nothing 100% conclusive.
Even if the SSB800 only had a single exposure performance of 56nm, it'd still likely have a smaller multiple exposure resolution than 28nm unless it had really, really lousy overlay performance.
 
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free_6ix9ine

Junior Member
Registered Member
Even if the SSB800 only had a single exposure performance of 56nm, it'd still likely have a smaller multiple exposure resolution unless it had really, really lousy overlay performance).

Yep. We don't know for sure what single exposure resolution is. But if we assume that 28nm is node after 4 exposures as an example. Than single exposure is 112nm.......
 

Skywatcher

Captain
Yep. We don't know for sure what single exposure resolution is. But if we assume that 28nm is node after 4 exposures as an example. Than single exposure is 112nm.......
To get that kind of performance, it'd have to essentially be the SSB600 with an immersion stage tacked on. SMEE isn't ASML, but I don't think it'd take them nearly a decade to add on an immersion stage.

EDIT: The SSA600 was available by 2011-12 at latest, and the SSB600 (at least its prototype) by 2011.

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Hendrik_2000

Lieutenant General
This article in English from China Tech News claims that SMEE 28nm Litho machine is a breakthrough and can produce 7nm Chips using multiple Patterning. Also gives a list of core component suppliers. Happy reading!

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Thanks excellent article Here is the most important paragraph. Seem like all domestic part supplier 100% Chinese made part! Beside Lithograph bottleneck basically the rest of chip production machinery domestic supplier are available

According to netizens, SSA800/10W photolithography machine uses NA 1.35 lens set, and is equipped with ultra-precision magnetic levitation duplex table and ultra-pure water immersion system. At the same time, the set-up accuracy index of Huazhuo Seiko workbench is better than 1.7nm. The photolititt uses a wavelength of 193nm of deep ultraviolet light, through lens imaging, and the principle of refraction can reach 28nm exposure effect, and then the use of double workbench for multiple exposure principles, has the potential to produce 7nm process. At the same time, the netizen also posted the Shanghai microelectronics duplex table exposure system operating control interface.


Shanghai Microelectronics 28nm lithography machine delivered next year! What's the point?



According to the information, the light source laser system of the photolithography machine is developed by the scientific source (the Chinese Academy of Sciences Microelectronics Institute, the Chinese Academy of Sciences Optoelectronics Institute, etc.), the double workbench of the Chinese Academy of Sciences is developed by Hua zhuo Seiko, the liquid system is developed by Zhejiang Qier Electromechanical Research and Development, up to 11nm process, and the lens and exposure system is developed by Guowang Optical (Changchun Optical Institute, Shanghai Light Machine, etc.)


(Note: About Hua Zhuo Seinco’s duplex table introduction can be seen in the core of the information previous article “breaking ASML lithography machine duplex technology monopoly!” HuaZhuo Jingke intends to land on the Science and Technology Board)


It is also worth mentioning that at present, Micro Semiconductor has successfully launched for 5nm process etching machine, and assume the “ArF photoresist (ArF laser light source wavelength 193nm) product development and industrialization”, 02 special project Nanda Optoelectronics has also developed ArF photoresist In addition, in the photolithography process of the coating of micro-electronics Shenyang core source glue / developer machine, glue dispensing machine, cleaning machine, deglue machine, wet method etching machine, etc. , can also be used for 6 inches and below and 8/12 inch single wafer treatment. It can be said that in the chip manufacturing related to a number of key links, the domestic has achieved a certain breakthrough.
 

WTAN

Junior Member
Registered Member
The Author compares the SMEE 28nm machine with the ASML 5nm EUV machine so i assume he implies that the SMEE machine has 28nm single exposure resolution.
Also bear in mind that the latest ASML Twinscan DUV 2000i has a stated resolution equal to or less than 38nm. (You can check this out on the ASML website) The actual ASML DUV single exposure resolution might be anywhere from 20nm to 38nm. ASML wont reveal the actual resolution as it is a trade secret. This will make the SMEE 28nm single exposure resolution look more reasonable and not so shocking and outstanding.
 

ansy1968

Brigadier
Registered Member
Hi WTAN

good day, Im a long time observer, after reading the article, is this the one you mention regarding the new 22nm litho launch this April
 

Hendrik_2000

Lieutenant General
Look like Samsung and TSMC are building production line with no American equipment
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The chip ban gives the world an enormous incentive to circumvent the US
by
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June 12, 2020
Huawei has plenty of ways to get around a US ban on chips. Photo: AFP

A US ban on foreign companies’ sales of chips to Huawei Technologies if American equipment or software is involved will undermine America’s already-weakened position in the global semiconductor equipment market, industry sources say.
Chip fabricators will remove American equipment from production lines in order to maintain market share in China, the world’s largest purchaser of semiconductors.
Samsung, the world’s biggest fabricator of memory as well as logic chips after Taiwan Semiconductor Manufacturing Corporation, already has set up a small production line for top-of-the-line 7-nanometer chips using only Japanese and European chip-making equipment, according to
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.


The Dutch firm ASML is the only provider of the Extreme Ultra-Violet (EUV) etching machines required to produce the tiny transistors on 7-nanometer chips, which can hold 10 billion transistors on a silicon wafer the size of a fingernail. Chip testing machines by Japan’s Lasertec sell for US$40 million apiece and are rated the best on the market.
Samsung and Huawei are considering a deal under which the South Korean giant would fabricate advanced chips for Huawei’s 5G equipment, and Huawei would in effect cede a substantial amount of its smartphone market share to Samsung, I reported in
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May 20. Mobile phones are Samsung’s flagship business, but they are a relatively small contributor to profits at Huawei, whose core business remains telecommunications equipment.


Ban ‘unacceptable’
South Korea exports almost twice as much to China as it does to the United States, and it relies on China to restrain the erratic North Korean regime. Seoul told Washington that the ban on sales of chips made with American equipment to Huawei and other Chinese companies was “unacceptable,” according to industry sources.
 
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