still says SSA800/10W is - single exposure - at 28nm,
multiple exposure can go down to 11nm... guancha is usually somewhat decent
also what you can do with the 28nm machine isnt the job of SMEE,
it's up to SMIC to work-out the lowest node they can make with the machine... or rather in cooperation with SMEE more likely
also I tried to look for the SSA800 page on SMEE's website referenced but I couldn't find it, I would appreciate a link to the page if possible, thanks
If true than it is more impressive than thought. ASML Duv uses 38nm single exposure to make 7nm chips. Euv is only 13.5 nm single exposure