Chinese semiconductor industry

Skywatcher · Jun 11, 2020

free_6ix9ine said:
Hmm ok, that makes more sense. ASML quotes their machines at 38nm resolution, which is single exposure resolution. If we assume that ssa800 can achieve a single exposure of around 38 or 40nm (depending on Numerical aperture and wet immersion), Theoretically assuming good overlay performance, 7nm would be possible?

Yes. Naura already has microelectronic components good enough for 14/16nm processing, so SMEE could likely have access to such similar microelectronics for overlay performance.

As for the "lowest resolution" on SMEE's site, my guess is that they don't put very much effort into their website.

free_6ix9ine · Jun 11, 2020

Skywatcher said:
Yes. Naura already has microelectronic components good enough for 14/16nm processing, so SMEE could likely have access to such similar microelectronics for overlay performance.

As for the "lowest resolution" on SMEE's site, my guess is that they don't put very much effort into their website.

Im not an expert in semiconductor, but I'm assuming you would need to scan a single wafer 6 times at 40 nm single pattern resolution to achieve 7nm, while adjusting the mask each time? Is that correct? While 13.5 nm single pattern resolution you can achieve 7nm with 2 scans?

free_6ix9ine · Jun 11, 2020

Skywatcher said:
Yes. Naura already has microelectronic components good enough for 14/16nm processing, so SMEE could likely have access to such similar microelectronics for overlay performance.

As for the "lowest resolution" on SMEE's site, my guess is that they don't put very much effort into their website.

Also why doesn't china skip euv and start researching gamma ray lithography or X-ray which is 100 pm?

Skywatcher · Jun 11, 2020

free_6ix9ine said:
Im not an expert in semiconductor, but I'm assuming you would need to scan a single wafer 6 times at 40 nm single pattern resolution to achieve 7nm, while adjusting the mask each time? Is that correct? While 13.5 nm single pattern resolution you can achieve 7nm with 2 scans?

Yes (though I honestly don't know the exact number of times you need to scan the wafer)

Skywatcher · Jun 11, 2020

free_6ix9ine said:
Also why doesn't china skip euv and start researching gamma ray lithography or X-ray which is 100 pm?

I suspect that you'd probably need as much resources to research gamma/x ray lithography (there are also performance issues, IIRC, regarding photomasks and decreased accuracy) and EUV has already been proven to work.

Canuck place · Jun 11, 2020

free_6ix9ine said:
Ignore my previous comments about SMEE 28 NM machine being able to make 7NM chips. I've gotten someone who can read Chinese to translate the SMEE website for me. It seems that SMEE uses the definition of resolution as the smallest node that the machine can produce. This is different from how ASML defines resolution.

ASML machine with 38 nm resolution can produce 7nm chips.

SMEE 28nm resolution cannot produce 7nm chips. The smallest node/chip that SMEE 28 nm can produce is 28nm.

So global times is right and I am wrong. This means that this isn't the breakthrough we are looking for and we are literally many years away from domestic lithograph that can produce 7nm chips.

That is very unfortunate if that's the case. But at least we know that China has to talent to design chips which can compete with the world best. It may take a while longer to make them.

free_6ix9ine · Jun 11, 2020

Skywatcher said:
I suspect that you'd probably need as much resources to research gamma/x ray lithography (there are also performance issues, IIRC, regarding photomasks and decreased accuracy) and EUV has already been proven to work.

I see. But a good thing about gamma ray lithography is we can skip the tin dropper LPP Light source. Instead, we can hook it up to one of our nuclear reactors and get massive amounts of gamma ray lol.

free_6ix9ine · Jun 11, 2020

Even more cool would be using a particle accelerator beam to carve into the wafer. If we had that level of technology. We can skip lithography all together. Since there would be no need for a mask anymore.

That way we don't need to manufacture mask or remove it.

free_6ix9ine · Jun 11, 2020

Instead of 5nm nodes, let's go straight to 0.5 nm node with new tech such as particle accelerator or gamma ray lithography. Then TSMC and ASML can shove their EUV machine up their collective a**.

Tyler · Jun 11, 2020

It looks like the increasingly ridiculous sanctions will result in the Yankees alienating the whole world and being isolated itself.

Chinese semiconductor industry

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