Chinese semiconductor industry

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tokenanalyst

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A transmissive spectral purity filter for suppressing infrared radiation in extreme ultraviolet lithography source​


Abstract:
We propose a transmissive spectral purity filter (SPF) with rectangular fishnet structures for laser-produced plasma extreme ultraviolet (EUV) lithography source. Such a transmissive SPF consists of a graphene-based thin membrane carrying a Molybdenum absorber pattern for the infrared (IR) radiation suppression. By using using the rigorous coupled wave analysis method, we investigate the optical properties of the transmissive SPF and optimize the structure parameters to suppress the out-of-band IR radiation. We analyze the dependence of the transparency at wavelength of 13.5 nm and infrared radiation suppression on the structure parameters. Theoretical analysis reveals that the transmittance at undesirable wavelength of 10.6μm is as low as 0.11%, while maintaining the in-band EUV transmittance as 75.92%, thereby enabling full separation of EUV and IR radiation from the EUV light source for high volume manufacturing lithography. Especially, the light incident angle on SPF has very little influence on both EUV and IR transmittances, thereby relaxing placement requirements significantly.​

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tokenanalyst

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Nanosheet Count Optimization Strategy of Complementary FET (CFET) Scaling Beyond 2 nm From Device to Circuit​


Complementary Field-Effect Transistors is one of the most promising structures for replacing GAA (Gate-All-Around) field-effect transistors while continuing the advancement of Moore's Law. Thus, optimizing its structure is a crucial research direction. This study proposes a nano-sheet count design strategy to address the issue of mismatched electron and hole mobilities in standard CFET cell and a nine-stage ring oscillator (RO). The simulation results demonstrate the effective matching of electron and hole mobilities by adjusting the ratio of NMOS (n-type) and PMOS (p-type) nano-sheet counts, thus enabling the optimization of circuit performance and power consumption for specific applications. In the CFET of the RO unit, a frequency increase of 10% and a capacitance reduction of 6% are achieved with only a 3% increase in power consumption, comparing a CFET with four P-doped nano-sheet channels and two N -doped nano-sheet channels to one with three P-doped nano-sheet channels and three N-doped nano-sheet channels.

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sunnymaxi

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LanceD23 said:
Since SMIC has purchased some DUV from ASML recently, ASML personnels on site for set up. can you check with your ASML source or hvpc's that they indeed seeing SMIC manufacturing for Huawei? ASML should know. Some folks convinced but I am not so much.
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so you are saying. Huawei itself produced 7nm chip.. its not

we have local people works in the industry, they actually can confirm. SMIC produced 7nm chip for Huawei. there is no other player as advanced as SMIC in mainland. Huawei just started their journey in chip manufacturing.
 
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tokenanalyst

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Now we are talking about, this is a clear step towards a decent E-Beam lithography.

Core technology breakthrough! Domestic 200kV transmission electron microscope enters small batch trial production​

In recent years, China has taken firm steps towards self-reliance in science and technology, with continuous breakthroughs in core technologies and the continuous emergence of high-end instruments and equipment. Recently, it was reported that the 200kV transmission electron microscope BZ-F200, independently developed by Suzhou Bozhong Instrument Technology Co., Ltd. (referred to as Bozhong Instrument), has entered the small batch trial production stage, marking a major breakthrough for the first domestically produced 200kV transmission electron microscope. Transmission electron microscopy is listed as one of the restricted "35 key technologies". It is an indispensable high-end scientific instrument in the fields of semiconductors, life sciences, materials science, etc. The domestic market demand is huge, but it has long relied on imports, so domestically produced Substitution is imperative.

1704213706280.png
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It is understood that the BZ-F200 product can be equipped with a thermal emission electron gun or a thermal field emission (Schottky) electron gun according to user needs, which can realize EDS, STEM and other functions. In addition to 200kV, its working voltage can also be switched to 80kV, 120kV and other levels. The lens barrel of the BZ-F200 is designed with a four-stage condenser illumination system, which can switch between micron beam and nanobeam, parallel beam and convergent beam modes.

1704213766868.png

The development of transmission electron microscopes has received widespread attention and support from all walks of life. Recently, academician Duan Wenhui, member of the National Committee of the Chinese People's Political Consultative Conference, executive director of the Chinese Physical Society, professor of the Department of Physics of Tsinghua University, and Professor Chen Xi of the Department of Physics of Tsinghua University, visited Bozhong Instruments to inspect the progress of the industrialization of domestic transmission electron microscopes, and to review the significant achievements achieved by Bozhong Instruments. It spoke highly of it, fully affirmed the active participation of private enterprises in the national strategy, and put forward ardent expectations for accelerating market promotion.

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Oldschool

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sunnymaxi said:
so you are saying. Huawei itself produced 7nm chip.. its not

we have local people works in the industry, they actually can confirm. SMIC produced 7nm chip for Huawei. there is no other player as advanced as SMIC in mainland. Huawei just started their journey in chip manufacturing.
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Huawei has a lithography company named SiCarrier and now heavily invest in Nanoimprint.
 
O

Oldschool

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tokenanalyst said:
Now we are talking about, this is a clear step towards a decent E-Beam lithography.

Core technology breakthrough! Domestic 200kV transmission electron microscope enters small batch trial production​

In recent years, China has taken firm steps towards self-reliance in science and technology, with continuous breakthroughs in core technologies and the continuous emergence of high-end instruments and equipment. Recently, it was reported that the 200kV transmission electron microscope BZ-F200, independently developed by Suzhou Bozhong Instrument Technology Co., Ltd. (referred to as Bozhong Instrument), has entered the small batch trial production stage, marking a major breakthrough for the first domestically produced 200kV transmission electron microscope. Transmission electron microscopy is listed as one of the restricted "35 key technologies". It is an indispensable high-end scientific instrument in the fields of semiconductors, life sciences, materials science, etc. The domestic market demand is huge, but it has long relied on imports, so domestically produced Substitution is imperative.

View attachment 123356
​
It is understood that the BZ-F200 product can be equipped with a thermal emission electron gun or a thermal field emission (Schottky) electron gun according to user needs, which can realize EDS, STEM and other functions. In addition to 200kV, its working voltage can also be switched to 80kV, 120kV and other levels. The lens barrel of the BZ-F200 is designed with a four-stage condenser illumination system, which can switch between micron beam and nanobeam, parallel beam and convergent beam modes.

View attachment 123357

The development of transmission electron microscopes has received widespread attention and support from all walks of life. Recently, academician Duan Wenhui, member of the National Committee of the Chinese People's Political Consultative Conference, executive director of the Chinese Physical Society, professor of the Department of Physics of Tsinghua University, and Professor Chen Xi of the Department of Physics of Tsinghua University, visited Bozhong Instruments to inspect the progress of the industrialization of domestic transmission electron microscopes, and to review the significant achievements achieved by Bozhong Instruments. It spoke highly of it, fully affirmed the active participation of private enterprises in the national strategy, and put forward ardent expectations for accelerating market promotion.

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A must have tool for semiconductor company.

That or scanning microscope scope to study competitor or self device internal layout structure.

It's a required tool.

Some has another gun on the side such as ion beam to modify the structure.
 
tphuang

tphuang

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LanceD23 said:
Since SMIC has purchased some DUV from ASML recently, ASML personnels on site for set up. can you check with your ASML source or hvpc's that they indeed seeing SMIC manufacturing for Huawei? ASML should know. Some folks convinced but I am not so much.
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These are questions easily verifiable if you actually search hvpc's old post. And same with your question on 1980Di and 2000i.

This is an actively moderated thread. As such, we expect higher quality posts than asking questions that can easily answered through searching. Please raise the quality of your posts going forward
 
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tonyget

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Phead128 said:
Anyways, it's just 3 DUV units of NTX:2100i/2050i, out of 1,400 ASML DUV (all types) already installed in China by end of 2023. This is less than 0.2% of all installed ASML DUV capacity, it isn't even worth this prolonged discussion.
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Who said there are 1400 ASML DUV machines in China now？The original statement says that since 1984，ASML delivered 1400 machines to China. That is i-line/Krf/DUV/dry/DUVi and metrology/inspection machines etc, all type combined number. Not to mention early delivered machine would already be retired by now.

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成立于1984年的阿斯麦在1988年首次向中国交付光刻机。截至目前，阿斯麦在中国的光刻机和量测的机台装机量近1400台。

ASML, founded in 1984, delivered its first lithography machine to China in 1988. As of now, ASML has nearly 1,400 installed photolithography machines and measurement machines in China.
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