GF was supposed to make a SOI fab. I wonder if that is still a requirement or not. HLMC is supposed to have some SOI process.
Chinese semiconductor industry
- Thread starter Hendrik_2000
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Do you guys remember the EUV DPP light source that Harbin was building? The last time I checked its looks like they achieved 150W of EUV power, although debris could be a problem with these light sources.
Either way, welp, looks like the guys who worked in the project decided to go commercially.
Good luck to the Harbin team, even if this light source is not used in the final EUV lithography machine, if compact enough it could be used for EUV wafer metrology, EUV Mask inspection and EUV tools inspection and calibration.
Either way, welp, looks like the guys who worked in the project decided to go commercially.
"Extreme Ultraviolet Semiconductor is a chip manufacturing equipment developer. Extreme UV lithography light sources can realize chip manufacturing of 7nm and below, and is committed to providing relevant services to users. Suzhou Extreme Ultraviolet Semiconductor Co., Ltd. was established in Zhangjiagang High-tech Zone by the team from Harbin Institute of Technology, and is making every effort to carry out industrialized research, development and production of extreme ultraviolet lithography light sources. At present, the company's team has completed the design of all parameters of the extreme ultraviolet lithography light source, and plans to complete the production of the extreme ultraviolet light source engineering prototype. After the prototype comes out, if it can pass the test, it can be sold immediately"
Good luck to the Harbin team, even if this light source is not used in the final EUV lithography machine, if compact enough it could be used for EUV wafer metrology, EUV Mask inspection and EUV tools inspection and calibration.
But this patent is from ''Suzhou Extreme Ultraviolet semiconductor Co. Ltd'' .. so Harbin Light source is also going to be commercialize? but the main question is, which institute light source will be used in EUV final machine ..
crazy to think China have multiple institutes to have own workable light source. next level competition
The next two years are a race to the finish, it seems. So Harbin's got the DPP light source, SIOM and CIOMP are on LPP and Tsinghua has SSMB. Any more players in there?
Shenzhen Free Electron Laser EUV and soft X-Ray facility.
Yeah and probably cheaper and easier to maintain but WAY more dirty than LPP so the collector mirror loss reflectivity pretty fast compared to LPP.
博尔芯 has developed an GaN/MOSFET high-speed driver chip PXL1005Q which has passed auto grade AEC-Q100 testing.
This particular chip will be used on Lidar, it's the first driver chip of this type to pass auto grade certification in China
This company is formed in 2022 and specializes in GaN Power supply, Lidar, 48V power supply & driver for various industrial and auto applications.
PXL1005Q has already started mass production & delivery to customers
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