Which Company provided by the ICP? Naura or AMEC?Interesting to see more domestic semiconductor research tools being used.
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Which Company provided by the ICP? Naura or AMEC?Interesting to see more domestic semiconductor research tools being used.
View attachment 121204View attachment 121205
Which Company provided by the ICP? Naura or AMEC?
An EDA tool for e-beam lithography (EBL) developed at Hunan University (HNU)
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The EBL-oriented EDA software tools are indispensable to design and manufacture EUV/DUV masks or sub-10 nm prototype devices. Some international treaties (e.g., 3.D.1-3 of Wassenaar Agreement [1]) and national laws (e.g., 3D003 of U.S. export control laws [2]) impose controls on exporting EBL-oriented EDA software tools to certain countries like China, Russian, etc.
We believe that EBL technologies should be used as friendly tools to improve lives of people from all countries without discrimination, rather than hostile weapons to deter the development of any country. Therefore, we are trying to develop these EBL EDA tools from scratch by ourselves. We license HNU-EBL EDA software, free of charge, to anybody from anywhere. To obtain a license, please click “license” and “contact us” on the top.
If that is not a giant middle finger, i don't know what else it is.
This article is incorrect. Nikon has been selling i-line systems and sold 23 so far in 2023 and 23 in 2022. They have been dropping in share and lost significantly to Canon which sold 138 i-line systems in 1H 2023. You can read about my analysis in this article:Nikon plans to export mature process lithography machines to Chinese market
Another hint that SMEE should jump start directly from 28nm and go down to more advanced nodes. There is no sense to enter commercial market in the overcrowded and ultra consolidated market of non DUV machines.
Maybe it's odd that SMEE, an outsider and a newcomer in the front-end litho market, has to start from the already most advanced DUV machine, just a step before EUV, while in normal conditions it would enter the market from the bottom and grow up from there, as is the standard....but of course these are not normal conditions.
BTW for China a machine that can just print power transistors and IGBT is not useful at all, China really needs advanced litho, not this stuff.
The article basically just stated lots of info that didn't really match the title, but I don't see anything that's glaringly incorrect.This article is incorrect. Nikon has been selling i-line systems and sold 23 so far in 2023 and 23 in 2022. They have been dropping in share and lost significantly to Canon which sold 138 i-line systems in 1H 2023. You can read about my analysis in this article:
The data for this article came from my report, and you can see the TOC here:
The article basically just stated lots of info that didn't really match the title, but I don't see anything that's glaringly incorrect.
The iLine stepper the article's title referred to is not the same as iLine stepper you are talking about.
The new Nikon I-line tool, NSR-2205iL, is a 5x stepper with lower NA lens/resolution capability to target very mature applications like MEMS, power devices, etc. These will take care of the most critical layers of older technology applications.
The I-line systems that you referred to as something Nikon has been selling, NSR SF155, are 4x steper with wee bit higher NA/ resolution and are meant as a complementary tool to handle less critical layers (to other 4x KrF/ArF/ArFi scanners for increasingly difficult layers) of more advanced logic/DRAM/3D-NAND applications.
The 2205iL1 is indeed cheaper tool than SF155 and is intended to capture the Chinese fab expansion in the older mature tech space, which Canon is dominating in. Much of Canon's iLine sales are 5x steppers, which ASML and Nikon do not compete in (with new tools). Nikon trying to get a piece of this pie that ASML doesn't play in is understandable.
Yes. Very expensive. So much for all the narrative about "cabbage-like" wafer price enabled by cheap domestic wafer fab equipment. At the price that Havok provided, it's almost twice more expensive than Canon FPA5550iZ2 price tag (in terms of USD) a few years back. With Japanese Yen significantly depreciated over the last few year, you should be able to buy the 5550iZ2 for less USD or RMB than before.Havok said SMEE i-line machine SSB800 costs 50 million RMB,do you think it's expensive?
Just double checking, but 50 million RMB is about 7 million USD under the current exchange rate. Is a FPA5550iZ2 only about 3-4 million usd? I thought the NXT 1950i cost about 30 million per unit? Did I get those prices right?Yes. Very expensive. So much for all the narrative about "cabbage-like" wafer price enabled by cheap domestic wafer fab equipment. At the price that Havok provided, it's almost twice more expensive than Canon FPA5550iZ2 price tag (in terms of USD) a few years back. With Japanese Yen significantly depreciated over the last few year, you should be able to buy the 5550iZ2 for less USD or RMB than before.
Furthermore, SSB800 i-line throughput, on paper or in actual performance, is only 50-70% of Canon/Nikon/ASML's FE iLine offering's throughput.
So, not only is the absolute price of SMEE SSB800 higher, the cost-per-wafer metric does not look good at all compared to the three incumbent's i-line offerings. SMEE still has lots to do to bring SSB800 to be competitive under free-market conditions. Short term, cost is not an issue for China, we need domestic capabilities at all cost. But in the long term, SMEE can't live off subsidies forever and we need them to provide capable tools that are also efficient and competitive vs. foreign competition's product offerings.