According to a SMEE Source the 28nm SMEE DUVL is equivalent to the ASML NXT1980i. This 1980i is currently used in the SMIC 14Nnm FAB.@WTAN. Based on some of the report, SMEE will have second generation of 28nm 4th quarter of 2021.
And 2023, 20nm scanner onboard. Based on that rate, maybe a 14nm scanner by 2025.
That means it gonna take a long time to reach 7nm scanner. I think the euv has to come out in 2025 and take over 7nm and below.
Alot of folks automatically assume one can do a 14nm process with double pattern with a 28nm scanner. That's absolutely false!
据报道,上海微电子设备(SMEE)有望在2021年第四季度交付其第二代深紫外(DUV)光刻扫描仪。
。报告称,到2023年,SMEE希望生产出足以用于20 nm节点的机械。
The insider said the current version SMEE 28nm DUVL is designed to produce Chips at the 28nm Node but it should be able to produce 14nm Chips.
The FABS using the DUVL will be the ones who will find out if it can do 14nm.
It really depends mainly on the Overlay Accuracy of the machine.
SMEE will improve the overlay accuracy of the machine gradually using feedback from the FABS that are operating the DUVL.
The ASML NXT1980i (14nm-28nm) came out in 2015 and the NXT2000i (5nm-7nm) came out in 2018, so basically a 2year difference.
I would expect the SMEE DUVL to have the same timeline as the ASML DUVL in terms of performance improvement.
But remember that this is China and SMEE might move faster if the customer has greater demands due to the current sanctions.
Yes.......the EUVL will be coming in 2025 and will allow China to FAB 5nm Chips. This news is driving alot of Anxiety among the American Politicians. If China gets the EUVL, then their Tech Policies on China has failed.