Xuzhou Bokang strives to make a breakthrough from raw materials, realizes the coverage of the entire industrial chain of "monomer-resin, photoacid-photoresist", and has made substantial progress in ensuring the safety, independence and controllability of the domestic photoresist material industry chain breakthrough. At present, ArF/KrF monomer and photoresist, G-line/I-line photoresist, electron beam photoresist series products have been successfully developed, which are widely used in integrated circuits, discrete devices, advanced packaging, etc., and customers cover domestic and Japanese , South Korea and other major integrated circuit leading manufacturers in the Asia-Pacific region. Among them, ArF-immersion products are already suitable for 28-45nm process.
Strong R&D team with rich professional capabilities in photoresist R&D and manufacturing
The core R&D team of Xuzhou Bokang is composed of experts in lithography materials and lithography technology at home and abroad. There are more than 200 R&D personnel in the company, of which more than 85% are undergraduates, and more than 35% are masters and doctors. They have rich professional capabilities in organic synthesis, polymer polymerization formula functional materials, and semiconductor-grade electronic-grade purification. By May 2023, there were 116 invention patents under review and 65 invention patents authorized. The company's R&D center is located in the Science and Technology Oasis of Caohejing Development Zone, Songjiang, Shanghai. It has 8,000 square meters of advanced modern laboratories, including more than 500 square meters of 100-level dust-free yellow light laboratories to support the development of photoresists. At the same time, it is equipped with advanced photolithography testing equipment and Other physical and chemical testing equipment such as ICP-MS, HPLC, GC, IR, etc.