Chinese semiconductor industry

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Alb

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Nope.

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At the end of the day these are all unilateral measures by the US. In theory the US can pass a legislation saying that China has to ask for US approval if it wants to use the sunlight or oxygen. The effectivness of these unilateral mesaures depends ultimately on the willingness of other countries to accept the diktats of the US empire!
 

ansy1968

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At the end of the day these are all unilateral measures by the US. In theory the US can pass a legislation saying that China has to ask for US approval if it wants to use the sunlight or oxygen. The effectivness of these unilateral mesaures depends ultimately on the willingness of other countries to accept the diktats of the US empire!
Hi Alb,

You're correct but miss the critical part , the light source , without it the EUVL can't function. Gigaphoton of Japan had develop a 250W LPP. But don't have a history of working with ASML cause early on the US decided to bypass Japan and let DARPA lead the way in developing an EUVL with ASML, CYMER and TSMC. That's how Japan was left out in the EUVL race and it need a partner badly to stay relevant. So who to partner with ,SMEE had all the tools needed except for a light source a match made in heaven? It's up to Japan to make that critical decision cause a year or two that opportunity will closed as China will find a solution from their current predicament.
 

Phead128

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If you throw Chinese Academy of Sciences + Huawei at a problem, it will get solved. US thinks it's deal with Iran or North Korea with "Sanctions" but China is a Second Superpower and technological powerhouse. US only forces China to indigenize, and with China's vastly larger marketsize, it's American companies that will eventually get screwed over in long-term as China adopt it's own supply chain for national security purposes.
How is the US/EU Arms embargo 1989 going for ya? China has AESA, Beidou, 5G, Drones, Advanced submarines, ASAT, Stealth jets, Jet engines, etc... It only make China stronger, and delayed it's modernization by only decade, but China is STRONKER because of it.
 

Oldschool

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SMIC reportedly gets US license to import equipment for use in mature processes​


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Trying to maintain market share and prevent the rise of china domestic equipment firms at process above 10nm. US must got the words SMEE delivering 28nm lithography in 2021.
Well, full 28nm for domestic equipment and materials self sufficiency is a stated goal and maintained regardless of US moves.
 

Oldschool

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Hi Alb,

You're correct but miss the critical part , the light source , without it the EUVL can't function. Gigaphoton of Japan had develop a 250W LPP. But don't have a history of working with ASML cause early on the US decided to bypass Japan and let DARPA lead the way in developing an EUVL with ASML, CYMER and TSMC. That's how Japan was left out in the EUVL race and it need a partner badly to stay relevant. So who to partner with ,SMEE had all the tools needed except for a light source a match made in heaven? It's up to Japan to make that critical decision cause a year or two that opportunity will closed as China will find a solution from their current predicament.
Germany Trumpf also has LPP. Do you know who makes EUV mirrors for the illumination and projection optics in China? I heard they are supposedly huge sized and difficult to make. Photoresist for EUV also need development
 
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Oldschool

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@WTAN
Can you explain more about the China EUV alliance between CAS and Chinese companies. You said Huawei is part of it and provide funding. Who else are joining the list? I think any chinese companies providing sub 10 nm chips in their product should involved in this alliance such as ZTE, Unisoc, Tencent , Alibaba. Those companies with deep pocket. I also think Chinese government can provide funding and supervision to oversee the progress being made according to time frame. No excuses for stuck in the mud scenario.. This huge project also can sub divide into many many pieces and get as many universities and academics involved as possible. Worst case, if the project take very long time but the infrastructure being setup for the entire country for fundamental science research with real world application urgent need. The key words is industrialization of many science ideas and inventions, which take alot of money., Not just some fancy paper theoretical research like so many done in the past in China because they normally takes little funding

Grass root national project, Similar Sputnik project for whole country in US trying to catch up to Soviets during Cold war.
 

WTAN

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@WTAN
Can you explain more about the China EUV alliance between CAS and Chinese companies. You said Huawei is part of it and provide funding. Who else are joining the list? I think any chinese companies providing sub 10 nm chips in their product should involved in this alliance such as ZTE, Unisoc, Tencent , Alibaba. Those companies with deep pocket. I also think Chinese government can provide funding and supervision to oversee the progress being made according to time frame. No excuses for stuck in the mud scenario.. This huge project also can sub divide into many many pieces and get as many universities and academics involved as possible. Worst case, if the project take very long time but the infrastructure being setup for the entire country for fundamental science research with real world application urgent need. The key words is industrialization of many science ideas and inventions, which take alot of money., Not just some fancy paper theoretical research like so many done in the past in China because they normally takes little funding

Grass root national project, Similar Sputnik project for whole country in US trying to catch up to Soviets during Cold war.
EUV Alliance is set up by CAS who is the main developer of the EUVL.
Basically companies which want to join are component manufacturers and end users which are FABs like SMIC, ICRD and Huawei etc.
All the component suppliers for the DUVL will also supply for the EUVL.
Similar to ASML Alliance which comprise Carl Zeiss, TSMC, SAMSUNG etc.
 
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